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HomeMaterials Science ForumMaterials Science Forum Vols. 173-174Properties of Recrystallized Amorphous Silicon...

Properties of Recrystallized Amorphous Silicon Prepared by XeCl Excimer Laser Irradiation

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Periodical:

Materials Science Forum (Volumes 173-174)

Pages:

29-34

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.173-174.29

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Online since:

September 1994

Authors:

I. Ulrych, K.M.A. El-Kader, V. Cháb, J. Kocka, P. Prikryl, V. Vydra, R. Cerný

Keywords:

a-Si:H, Excimer Laser, Mathematical Models, Recrystallization, Scanning Electron Microscope (SEM), TRR

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© 1995 Trans Tech Publications Ltd. All Rights Reserved

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