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Conditions for Heterophase Junction Formation in Laser Deposited PbTe Films
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HomeMaterials Science ForumMaterials Science Forum Vols. 173-174Vacuum Ultraviolet Deposition of Silicon...

Vacuum Ultraviolet Deposition of Silicon Dielectrics

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Semiconductor Processing and Characterization with Lasers

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Periodical:

Materials Science Forum (Volumes 173-174)

Pages:

81-92

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.173-174.81

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Online since:

September 1994

Authors:

Ian W. Boyd

Keywords:

Dielectric, Excimer Lamp, Multilayer, Photochemistry, Photo-CVD, Photodeposition, Silicon Dioxide, Silicon Oxynitride, Thin Film, Ultraviolet, Vacuum Ultraviolet

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© 1995 Trans Tech Publications Ltd. All Rights Reserved

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