Models of Oxygen Loss and Thermal Donor Formation in Silicon by the Clustering of Rapidly Diffusing Oxygen Dimers

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Periodical:

Materials Science Forum (Volumes 196-201)

Edited by:

M. Suezawa and H. Katayama-Yoshida

Pages:

1309-1314

DOI:

10.4028/www.scientific.net/MSF.196-201.1309

Citation:

S.A. McQuaid et al., "Models of Oxygen Loss and Thermal Donor Formation in Silicon by the Clustering of Rapidly Diffusing Oxygen Dimers", Materials Science Forum, Vols. 196-201, pp. 1309-1314, 1995

Online since:

November 1995

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$35.00

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