Influence of the Plasma Regime on the Structural, Optical, Electrical and Morphological Properties of a-Si:H Thin Films

Abstract:

Article Preview

Info:

Periodical:

Edited by:

R. Martins, I. Ferreira, E. Fortunato and G. Kroesen

Pages:

11-20

DOI:

10.4028/www.scientific.net/MSF.382.11

Citation:

H. Águas et al., "Influence of the Plasma Regime on the Structural, Optical, Electrical and Morphological Properties of a-Si:H Thin Films", Materials Science Forum, Vol. 382, pp. 11-20, 2001

Online since:

November 2001

Export:

Price:

$35.00

In order to see related information, you need to Login.