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HomeMaterials Science ForumMaterials Science Forum Vol. 382Influence of the Plasma Regime on the Structural,...

Influence of the Plasma Regime on the Structural, Optical, Electrical and Morphological Properties of a-Si:H Thin Films

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Periodical:

Materials Science Forum (Volume 382)

Pages:

11-20

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.382.11

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Online since:

November 2001

Authors:

Hugo Águas, Rodrigo Martins, Yuri Nunes, Manuel J.P. Maneira, Elvira Fortunato

Keywords:

Ion Bombardment, Langmuir Probe, Material, Plasma Process Regimes

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Сopyright:

© 2001 Trans Tech Publications Ltd. All Rights Reserved

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