Performance Stability of Microfocusing Source and Multilayer Optics Based X-Ray Diffraction System

Bonglea Kim; Boris Verman; Licai Jiang

doi:10.4028/www.scientific.net/MSF.443-444.159

Paper Titles

Single Reflection Method for Pole-Density Measurements Accounting for Secondary Extinction in Textured Films
p.141

A Quantitative Basis for Rocking Curve Measurement of Highly Oriented Polycrystalline Thin Films
p.145

Investigating X-Ray Bragg-Line Displacement as a Technique for Determination of the Thermal Expansion Coefficient of Solid Samples
p.151

Small Angle X-Ray Scattering with Cobalt Radiation for Nanostructure Characterization of Fe-Based Specimen
p.155

Performance Stability of Microfocusing Source and Multilayer Optics Based X-Ray Diffraction System
p.159

Fitting of Reciprocal Space Maps of Thin Films with Texture and Stress
p.163

Analytical Comparison of Parallel Beam and Bragg-Brentano Diffractometer Performances
p.167

A Simple Analytical Approach to Describe a Beam Conditioning System
p.171

128-Channel Silicon Strip Detector Installed at a Powder Diffractometer
p.175

HomeMaterials Science ForumMaterials Science Forum Vols. 443-444Performance Stability of Microfocusing Source and...

Performance Stability of Microfocusing Source and Multilayer Optics Based X-Ray Diffraction System

Abstract:

X-ray diffraction systems based on a microfocusing X-ray source and multilayer side-by-side optics are suitable for X-ray diffraction studies in a variety of fields, such as protein crystallography, due to their compactness and low cost in maintenance. However, new problems can occur, such as intensity instability induced by source position drifting. Various investigations for the reasons and the consequences of the instability are presented in this paper. Feasible solutions and suggestions are given to obtain more stable system performance.