Microstructure and Optical Properties of (Zr_0.8, Sn_0.2)TiO4 Thin Films Grown on Si(100) Substrates by a Sol-Gel Process

Abstract:

Amorphous and crystalline (Zr0.8,Sn0.2)TiO4 （ZST） thin films deposited on Si(100) substrates have been prepared by a sol-gel process. The crystal structure and surface morphologies of the thin films have been studied by X-ray diffraction and atomic force microscopy. The crystalline ZST films on Si(100) substrata with a (111) orientation The refractive index n and extinction coefficient k of the amorphous and crystalline thin films were obtained by spectroscopy ellipsometry as a function of phone energy in the range from 0.7 to 5.4 eV. The absorption edges for amorphous and crystalline ZST are 3.83 and 3.51eV of indirect–transition type respectively.

• Periodical: Materials Science Forum (Volumes 475-479)
• Pages: 3693-3696
• DOI: https://doi.org/10.4028/www.scientific.net/MSF.475-479.3693
• Online since: January 2005
• Authors: Wen Xiu Cheng, Ai Li Ding, Ping Sun Qiu
• Keywords: (Zr_0.8, Sn_0.2) TiO4 (ZST)Thin Film, Optical Property, Sol-Gel (SG)

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