The Use of Trimethylaluminum for Producing Surface Layers by the PACVD Method

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The paper presents the use of trimethylaluminum in PACVD method to obtain the surface layers like alumina or aluminum nitride on Inconel nickel alloy. The glow discharge nitriding at a temperature of 750°C leads to the formation of aluminum oxynitride in the layer, whereas annealing in argon plasma at a temperature of 1050°C – to the formation of nickel and aluminum based intermetallic phases of the NiAl or Ni3Al type with aluminum oxide present within the outer zone of the coating. The presence of the surface layer of the Al2O3+NiAl+Ni3Al type formed on nickel alloys may be significant from the point of view of the applications that require a high heat resistance.

Info:

Periodical:

Materials Science Forum (Volumes 475-479)

Main Theme:

Edited by:

Z.Y. Zhong, H. Saka, T.H. Kim, E.A. Holm, Y.F. Han and X.S. Xie

Pages:

3887-3890

DOI:

10.4028/www.scientific.net/MSF.475-479.3887

Citation:

J. R. Sobiecki et al., "The Use of Trimethylaluminum for Producing Surface Layers by the PACVD Method", Materials Science Forum, Vols. 475-479, pp. 3887-3890, 2005

Online since:

January 2005

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$35.00

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