Structure of Ti1-XTaxN Thin Films Prepared by DC-Magnetron Sputtering

O. Bourbia; N. Guerfi; S. Achour; Nouar Tabet; A. Mosser

doi:10.4028/www.scientific.net/MSF.480-481.387

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HomeMaterials Science ForumMaterials Science Forum Vols. 480-481Structure of Ti1-XTaxN Thin Films Prepared by...

Structure of Ti_1-XTa_xN Thin Films Prepared by DC-Magnetron Sputtering

Abstract:

X-ray photoelectron spectroscopy (XPS) and high resolution transmission electron microscopy (HRTEM) were used to investigate the effect of tantalum addition on the TiN thin films structure. Both the HRTEM and selected area electron diffraction have showed that the films possess a fine grained polycrystalline structure with an average grain size in the order of 10 nm. The chemical composition of the films was determined by the use of the Ti2p, N1s and Ta4f core level peaks. The analysis of Ta4f core level revealed the presence of Ta-N bond indicating that tantalum atoms can occupy the titanium sublattice sites. Moreover, the XPS spectra revealed the presence of Ta2O5 in the films.

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Periodical:

Materials Science Forum (Volumes 480-481)

Pages:

387-392

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.480-481.387

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Online since:

March 2005

Authors:

O. Bourbia, N. Guerfi, S. Achour, Nouar Tabet, A. Mosser

Keywords:

DC Magnetron Sputtering, High Resolution Transmission Electron Microscopy, Structure, Ti_1-XTa_xN, X-Ray Photoelectron Spectroscopy (XPS)

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References

[1] G. I. Grigorov and I. N. Martev: Thin Solid Films 137 (1986) 1.

Google Scholar

[2] M. Kawamura, Y. Abe and K. Sazaki: J. Vac. Sci. Technol., A16 (1) (1998) 200.

Google Scholar

[3] A. G. Spencer, M. Georgson, C. A. Bishop, E. Stenberg and R. P. Howson: Sol. Energy Materials, 18 (1988) 87.

Google Scholar

[4] M. Georgson, A. Roos and C. G. Ribbing: J. Vac. Sci. Technol., A9(4) (1991) 2191.

Google Scholar

[5] K. E. Andersson, M. K. Wahlstrom and A. Roos: Thin Solid Films, 214 (1992) 213.

Google Scholar

[6] O. Bourbia, S. Achour, S. Zerkout, M. Benkahoul and A. Harabi: Key Engineering Materials, 206-213 (2002) 523.

DOI: 10.4028/www.scientific.net/kem.206-213.523

Google Scholar

[7] S. Zerkout, S. Achour, A. Mosser and N. Tabet: Thin Solid Films, 441 (2003) 135.

DOI: 10.1016/s0040-6090(03)00850-2

Google Scholar

[8] N. Guerfi: Doctoral Thesis, Grenoble (1991).

Google Scholar

[9] Q. Y. Zhang, X. X. Mei, D. Z. Yang, F. X. Chen, T. C. Ma, Y. M. Wang, F. N. Teng: Nucl. Inst. and Meth. in Phys. Res. B 127/128 (1997) 664-668.

Google Scholar

[10] H. Hochst, R. D. Bringans, P. Steiner and Th. Wolf: Phys. Rev. B 25 (1982) 7183.

Google Scholar

[11] C. D. Wagner, W. M. Riggs, L. E. Davis, J. F. Moulder and G. E. Muilenberg: Handbook of X-Ray Photoelectron Spectroscopy (Perkin-Elmer, Physical Electronics Division, Eden Prairie, MN, 1979).

DOI: 10.1002/sia.740030412

Google Scholar

[12] P. -Y. Jouan, M. -C. Peignon, Ch. Cardinaud and G. Lempérière: Appl. Surf. Sci. 68 (1993) 595-603.

Google Scholar