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HomeMaterials Science ForumMaterials Science Forum Vols. 505-507Characterization of Polycrystalline Si Films...

Characterization of Polycrystalline Si Films Produced by ArF Excimer Laser Irradiation

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Progress on Advanced Manufacture for Micro/Nano Technology 2005

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Periodical:

Materials Science Forum (Volumes 505-507)

Pages:

265-270

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.505-507.265

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Online since:

January 2006

Authors:

Ta Tung Chen, C.Y. Chang

Keywords:

A-Si, Excimer Laser Irradiation, Poly-Si, Surface Morphology, TFT-LCD

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© 2006 Trans Tech Publications Ltd. All Rights Reserved

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