A Pulse DC Plasma Deposited Resistor Process
The pulse DC plasma system offers so highly instant power to generate extremely intense plasma density that its applications are widely extended. In this work, the development of pulse DC plasma processing is studied for the sheet resistors, and the manufacturing mechanism relative to the properties of copper particles deposited on plastic materials is discussed by using atomic force microscopy and line-resistance measured technique.
Wunyuh Jywe, Chieh-Li Chen, Kuang-Chao Fan, R.F. Fung, S.G. Hanson,Wen-Hsiang Hsieh, Chaug-Liang Hsu, You-Min Huang, Yunn-Lin Hwang, Gerd Jäger, Y.R. Jeng, Wenlung Li, Yunn-Shiuan Liao, Chien-Chang Lin, Zong-Ching Lin, Cheng-Kuo Sung and Ching-Huan Tzeng
F. L. Wen et al., "A Pulse DC Plasma Deposited Resistor Process", Materials Science Forum, Vols. 505-507, pp. 865-870, 2006