Effect of Nano-Structures on the Optical Features of Hydrogenated Amorphous Si Films

Abstract:

Hydrogenated amorphous Si (a-Si:H) films were prepared by plasma enhanced chemical vapor deposition (PECVD) techniques, and the effect of nano-structure on the photoluminescence (PL) phenomena of the films was investigated. The films, which were prepared at R.T., contain both amorphous and crystalline phases of 1 ~ 3 nm size nano-crystallites with {100} orientation preference while the films prepared at 500°C are composed of about 6 nm and 150 nm size crystallites. The former exhibit a strong PL intensity near blue light region, while the latter exhibiting little PL phenomena; also, the optical band gap of the former was calculated at 4.2 eV.

• Periodical: Materials Science Forum (Volumes 510-511)
• Pages: 954-957
• DOI: https://doi.org/10.4028/www.scientific.net/MSF.510-511.954
• Online since: March 2006
• Authors: Myung Beom Park, Jae Hyun Shim, Nam Hee Cho
• Keywords: Hydrogenated Amorphous Si, Optical Band Gap, Photoluminescence (PL)

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