Structure and Electrochemical Characterization of Electrolytic Ni-Co-P and Ni-W-P Layers
Ni-P, Ni-Co-P and Ni-W-P layers were obtained in galvanostatic conditions, at the current density jdep= 0.200 A cm-2. The X-ray diffraction method was used to determine phase composition of the layers and the atomic absorption spectrometry was applied to specify their chemical composition. A metallographic, stereoscopic and tunneling microscope and also Form Talysurf-type profilograph were used for cross-section and surface morphology characterization of the layers. The behaviour of obtained layers was investigated in the processes of hydrogen and oxygen evolution from 5 M KOH using voltammetry method. It was ascertained that, introduction of cobalt or tungsten into Ni-P matrix, lead to obtain the layers about very developed surface. Thus obtained layers may be useful in application as electrode materials in electrochemistry.
Paula Maria Vilarinho
M. Popczyk, A. Budniok, H. Scholl, T. Blaszczyk, "Structure and Electrochemical Characterization of Electrolytic Ni-Co-P and Ni-W-P Layers", Materials Science Forum, Vols. 514-516, pp. 460-464, 2006