Structure and Electrochemical Characterization of Electrolytic Ni-Co-P and Ni-W-P Layers

Abstract:

Ni-P, Ni-Co-P and Ni-W-P layers were obtained in galvanostatic conditions, at the current density jdep= 0.200 A cm-2. The X-ray diffraction method was used to determine phase composition of the layers and the atomic absorption spectrometry was applied to specify their chemical composition. A metallographic, stereoscopic and tunneling microscope and also Form Talysurf-type profilograph were used for cross-section and surface morphology characterization of the layers. The behaviour of obtained layers was investigated in the processes of hydrogen and oxygen evolution from 5 M KOH using voltammetry method. It was ascertained that, introduction of cobalt or tungsten into Ni-P matrix, lead to obtain the layers about very developed surface. Thus obtained layers may be useful in application as electrode materials in electrochemistry.

• Periodical: Materials Science Forum (Volumes 514-516)
• Pages: 460-464
• DOI: https://doi.org/10.4028/www.scientific.net/MSF.514-516.460
• Online since: May 2006
• Authors: Magdalena Popczyk, Antoni Budniok, Henryk Scholl, Tadeusz Blaszczyk
• Keywords: Amorphous Ni-P Matrix, Cobalt, Electrolytic Layers, Tungsten

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