Optimization of Deposition Parameters for Thin Silicon Films on Flexible Substrates in a Hot-Wire Chemical Vapor Deposition Reactor

Abstract:

Article Preview

Info:

Periodical:

Materials Science Forum (Volumes 514-516)

Edited by:

Paula Maria Vilarinho

Pages:

475-482

Citation:

P. Alpuim et al., "Optimization of Deposition Parameters for Thin Silicon Films on Flexible Substrates in a Hot-Wire Chemical Vapor Deposition Reactor", Materials Science Forum, Vols. 514-516, pp. 475-482, 2006

Online since:

May 2006

Export:

Price:

$38.00

Fetching data from Crossref.
This may take some time to load.