Optimization of Deposition Parameters for Thin Silicon Films on Flexible Substrates in a Hot-Wire Chemical Vapor Deposition Reactor

Pedro Alpuim; M. Ribeiro; Sergej Filonovich

doi:10.4028/www.scientific.net/MSF.514-516.475

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Optimization of Deposition Parameters for Thin Silicon Films on Flexible Substrates in a Hot-Wire Chemical Vapor Deposition Reactor

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Materials Science Forum (Volumes 514-516)

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475-482

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https://doi.org/10.4028/www.scientific.net/MSF.514-516.475

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Online since:

May 2006

Authors:

Pedro Alpuim, M. Ribeiro, Sergej Filonovich

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Flexible Electronics, Hot-Wire CVD, Nanocrystalline Silicon, Thin Film

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