Optimization of Deposition Parameters for Thin Silicon Films on Flexible Substrates in a Hot-Wire Chemical Vapor Deposition Reactor

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Periodical:

Materials Science Forum (Volumes 514-516)

Edited by:

Paula Maria Vilarinho

Pages:

475-482

DOI:

10.4028/www.scientific.net/MSF.514-516.475

Citation:

P. Alpuim et al., "Optimization of Deposition Parameters for Thin Silicon Films on Flexible Substrates in a Hot-Wire Chemical Vapor Deposition Reactor", Materials Science Forum, Vols. 514-516, pp. 475-482, 2006

Online since:

May 2006

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$35.00

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