Microstructure and Electric Transport Characteristic of Microcrystalline Silicon Films Fabricated by Very High Frequency Plasma Enhanced Chemical Vapor Deposition

Abstract:

Article Preview

Microcrystalline silicon (μc-Si:H) film deposited on silicon oxide in a very high frequency plasma enhanced chemical vapor deposition with highly H2 dilution of SiH4 has been investigated by Raman spectroscopy and high resolution transmission electron microscopy. Raman spectroscopy results show that the crystalline volume fraction increases with increasing the hydrogen flow rate and for the hydrogen flow rate of 160 sccm, the crystalline volume fraction reaches to 67.5%. Nearly parallel columnar structures with complex microstructure are found from cross-sectional transmission electron microscopy images of the film. The temperature depend dark conductivity and activation energy are studied in order to investigate the electronic transport processes in the nc-Si films.

Info:

Periodical:

Materials Science Forum (Volumes 663-665)

Edited by:

Yuan Ming Huang

Pages:

600-603

DOI:

10.4028/www.scientific.net/MSF.663-665.600

Citation:

X. Wang et al., "Microstructure and Electric Transport Characteristic of Microcrystalline Silicon Films Fabricated by Very High Frequency Plasma Enhanced Chemical Vapor Deposition", Materials Science Forum, Vols. 663-665, pp. 600-603, 2011

Online since:

November 2010

Export:

Price:

$38.00

[1] P.R. Cabarrocas, R. Brenot, P. Bulkin, R. Vanderhaghen, B. Drevillon and I. French: J. Appl. Phys. Vol. 86 (1999), p.7079.

[2] A.H. M. Smets, T. Matsui and M. Kondo: J. Appl. Phys. Vol. 104 (2008), p.034508.

[3] K. Adhikary and S. Ray: J. Non-Cryst. Solids. Vol. 353 (2007), p.2289.

[4] L.C. Wu, M. Dai, X.F. Huang, W. Li and K.J. Chen: J. Vac. Sci. Phys. Vol. 95 (2004), p.640.

[5] J. Xu, Z.H. He, K.J. Chen, X.F. Huang and D. Feng: J. Phys. Condens. Matter. Vol. 11 (1999), p.1631.

[6] R. Saleh and N. H. Nickel: Thin Solid Films. Vol. 427 (2003), p.266.

[7] Y. Li, L. Li, S.J.A. Anna, Delahoy, E. Alan, Levy and A. Roland: Thin Solid Films. Vol. 483 (2005), p.84.

[8] Q. Wang, G.Z. Yue, J. Li and D. Han: Solid State Commun. Vol. 113 (2000), p.175.

In order to see related information, you need to Login.