In Situ X-Ray Reflectivity Study of Imprint in Ferroelectric Thin Films

Abstract:

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The structural origin of imprint in Pb(Zr,Ti)O3 (PZT) ferroelectric thin films derived by chemical solution deposition with Pt top and bottom electrodes was studied by in-situ high-resolution X-ray specular reflectivity of synchrotron radiation. Global structural parameters of density, thickness, and surface or interface roughness of each component layer in the thin film sample were obtained. No generation of interfacial layers with a different electron density from PZT and no interface roughening were observed at the interfaces of PZT and Pt during imprint. Thus, the results suggest that the imprint effect is more likely a bulk or electronic defects-related phenomenon.

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Periodical:

Edited by:

Chengming Li, Chengbao Jiang, Zhiyong Zhong and Yichun Zhou

Pages:

292-296

DOI:

10.4028/www.scientific.net/MSF.687.292

Citation:

J. L. Cao et al., "In Situ X-Ray Reflectivity Study of Imprint in Ferroelectric Thin Films", Materials Science Forum, Vol. 687, pp. 292-296, 2011

Online since:

June 2011

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$35.00

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