Analysis of ZAO Thin Films by DC Reaction Magnetron Sputtereing

Abstract:

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The high quality ZAO thin films were produced by DC reaction magnetron sputtering technology. The XRD, electrical and optical properties of ZAO thin films were particularly investigated. The results show that ZAO films are polycrystalline hexagonal wurtzite structure,and Al2O3 crystal phase are not found. At the same time,the high quality ZAO films with the minimum resistivity of 4.5x×10-4Ω·㎝, the transmittance in visible region above 80% and the reflectivity in IR region above 70% are gained.

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Periodical:

Edited by:

Chengming Li, Chengbao Jiang, Zhiyong Zhong and Yichun Zhou

Pages:

585-590

DOI:

10.4028/www.scientific.net/MSF.687.585

Citation:

F. Lu et al., "Analysis of ZAO Thin Films by DC Reaction Magnetron Sputtereing", Materials Science Forum, Vol. 687, pp. 585-590, 2011

Online since:

June 2011

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Price:

$35.00

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