Preparation of Fluorine Doped Tin Oxide Film by Ultrasonic Spray Pyrolysis

Yang Ren; Gao Yang Zhao; Jie Shen

doi:10.4028/www.scientific.net/MSF.695.594

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HomeMaterials Science ForumMaterials Science Forum Vol. 695Preparation of Fluorine Doped Tin Oxide Film by...

Preparation of Fluorine Doped Tin Oxide Film by Ultrasonic Spray Pyrolysis

Abstract:

Fluorine doped tin oxide (FTO) film is one of the most promising transparent conducting materials. It can be used for Low-E glasses, thin film solar cells, displays, etc. FTO film can be fabricated by various techniques. The technique of sol-gel combined with ultrasonic spray pyrolysis gives the possibility to produce high-quality large-scale FTO films. In this paper, the FTO sol is successfully prepared using pentahydrate stannic chloride (SnCl₄•5H₂O), hydrogen fluoride (HF) and methanol. Using the FTO sol, FTO films are prepared by ultrasonic spray pyrolysis technique. X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), and atomic force microscopy (AFM) are used to characterize the FTO films coated on glass substrates. Results indicate that the as-deposited films are polycrystalline SnO₂ phase with tetragonal crystal structure, and that the average grain size for the samples is 160nm. The optical and electrical properties of the FTO film are also analyzed.

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Periodical:

Materials Science Forum (Volume 695)

Pages:

594-597

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.695.594

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Online since:

July 2011

Authors:

Yang Ren, Gao Yang Zhao, Jie Shen

Keywords:

Emissivity, Resistivity, TiN Oxide, Ultrasonic Spray Pyrolysis

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