Dependence of the Surface Roughness and Localization Factor Parameters on the Background Correction of AFM Images: A Thin Film Characterization Study

Attila Bonyár; Lászlo Milán Molnár; Gábor Harsányi

doi:10.4028/www.scientific.net/MSF.729.193

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HomeMaterials Science ForumMaterials Science Forum Vol. 729Dependence of the Surface Roughness and...

Dependence of the Surface Roughness and Localization Factor Parameters on the Background Correction of AFM Images: A Thin Film Characterization Study

Abstract:

A novel parameter called localization factor was calculated on contact mode atomic force microscope (AFM) images taken on gold thin film surfaces and was compared with the surface roughness parameters (R_a, R_RMS). The aim of the investigation was to examine the dependence of these surface describing parameters on the background correction (generally post processing) of the AFM image. We found that the proposed localization factor parameter shows less dependence on the background correction compared to the surface roughness parameters and that it gives an identically characteristic value for four different thin film surfaces on the (1-100 μm²) scan range.

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Periodical:

Materials Science Forum (Volume 729)

Pages:

193-198

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.729.193

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Online since:

November 2012

Authors:

Attila Bonyár, Lászlo Milán Molnár, Gábor Harsányi

Keywords:

Atomic Force Microscopy (AFM), Background Correction, Gold Thin Film, Localization Factor, Structural Entropy, Surface Roughness (SR)

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References

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