Morphology and Residual Stress of Ultrathin Al Films Confined by AlN Layers

Abdulloh Rifai; Ji Shi; Yoshio Nakamura

doi:10.4028/www.scientific.net/MSF.750.276

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HomeMaterials Science ForumMaterials Science Forum Vol. 750Morphology and Residual Stress of Ultrathin Al...

Morphology and Residual Stress of Ultrathin Al Films Confined by AlN Layers

Abstract:

Ultrathin Al films have been prepared in modulated Al/AlN multilayer structures by DC magnetron sputtering. The surface morphology was observed by scanning probe microscopy (SPM). SPM images show that ultrathin Al films consist of equiaxial in-plane grains. The surface roughness for 20 nm-thick Al film which is more than 1 nm is quite large. Full (2θ, ψ)-scan by 2 dimensional XRD (2D - XRD) confirms that ultrathin Al film has highly (111) texture. Residual stress of ultrathin Al films was observed by applying sin²Ψ method. It is found that 5 nm-thick and 10 nm-thick Al films are subjected to compressive stress due to the influence of Volmer-Weber growth mechanism during sputtering. All samples are subjected to tensile stress after annealing. The unstrained interplanar spacing of Al films expands when the thickness is reduced below 10 nm and contracts with increasing annealing temperature.

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Periodical:

Materials Science Forum (Volume 750)

Pages:

276-279

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.750.276

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Online since:

March 2013

Authors:

Abdulloh Rifai, Ji Shi, Yoshio Nakamura

Keywords:

(111) Texture, Aluminum (Al), Morpholoy, Residual Stress, Surface Roughness (SR), Ultrathin Films

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