Micro, Nano and Ultranano-Crystalline Diamond Deposition

Abstract:

This is a comparative experimental study of the micro, nanoand ultranano-crystalline diamond deposition. The Hot Filament Chemical Vapor Deposition (HFCVD) reactor deposits the films using different deposition parameters. Scanning Electron Microscopy and Field Emission Scanning Electron Microscopy let morphology inspection. Visible-Raman scattering loaded to estimating relative induced stress, by the graphite peak shift and associated with the defect incorporation and sp² bond enhancement. The x-ray diffraction confirmed the diamond crystallinity, where Scherrer ́s equations estimate crystallite size and diamond renucleation rates. In this work we propose a defect increasing relative graphite incorporation with the transition of micro, nanoto ultranano-crystalline diamond deposition. Besides this, we propose that this increase defects follows the increase diamond renucleation rates and decreases in the induced stress films. Included is a discussion of the possible reasons for these observations.

• Periodical: Materials Science Forum (Volume 802)
• Pages: 168-173
• DOI: https://doi.org/10.4028/www.scientific.net/MSF.802.168
• Online since: December 2014
• Authors: Divani C. Barbosa*, M.R. Baldan, V.J. Trava-Airoldi, Evaldo Jose Corat
• Keywords: Diamond, HFCVD, Micro, Nano, Ultranano

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