Effect of Nitrogen Content on Mechanical and Tribological Properties of HfCxNy Films Deposited by Reactive Magnetron Sputtering

Shuo Wang; Kan Zhang; Xin Guo; Su Xuan Du; Mao Wen; Wei Tao Zheng

doi:10.4028/www.scientific.net/MSF.817.143

Paper Titles

Effect of Niobium Additions on Austenite Grain Coarsening Behavior of GCr15 Bearing Steel
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Surface Decarburization Behavior of Spring Steel 60Si2MnA under A_C1 Temperature and in Temperature Range A_C3-G
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Thermal Stability of Microstructure and Mechanical Properties of NbNhard Films
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Effect of Nitrogen Content on Mechanical and Tribological Properties of HfC_xN_y Films Deposited by Reactive Magnetron Sputtering
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Effect of Cu Content on the Formability and Portevin-Le Chatelier Effect of Al-Mg Alloys
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Influence of Air Heat Treatment on Bonding Strength and Microstructure of Al₂O₃-13wt%TiO₂/NiCrAl Coating
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HomeMaterials Science ForumMaterials Science Forum Vol. 817Effect of Nitrogen Content on Mechanical and...

Effect of Nitrogen Content on Mechanical and Tribological Properties of HfC_xN_y Films Deposited by Reactive Magnetron Sputtering

Abstract:

Based on previous work on lubricant hard HfC_x film, the HfC_xN_yfilmswere deposited by sputtering from theHf target in a mixture of discharging N₂,Ar and CH₄, and the N content in films was accurately controlled by changing the N₂ flow rate.Theintroduction of N into the films contributed to the presence of solid solution FCC-HfC(N) and FCC-HfNphase appeared at high N content in films. In addition, the a-C content in the filmsdecreasedwith increment ofN content in the films. In comparison with HfC_x film, hardness of HfC_xN_y films were enhanced from 21 GPa to 25 GPa with N content rising to 6.8 at.% but then surplus N in the films impaired the hardness. The coefficient of friction and surface roughness for HfC_xN_y films increasedfrom 0.10 to 0.23 and 3.13 nm to 12.4 nm, respectively, with decreasing a-C content from 52.9 at.% to 46.3 at.%. However, the introduction of N into HfC_xFilm improvedthe wear resistance of filmseffectively, and the specific friction rate for this HfC_xN_yfilm deposited at 8 sccm N₂was only 6.17×10^-7 mm³/Nm about half of that of HfC_x film (1.09×10^-⁶mm³/Nm).

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Materials Science Forum (Volume 817)

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143-149

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https://doi.org/10.4028/www.scientific.net/MSF.817.143

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April 2015

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Shuo Wang, Kan Zhang, Xin Guo, Su Xuan Du, Mao Wen, Wei Tao Zheng

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Friction, Hardness, HfC_xN_y Thin Films, Sputtering, Wear

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