TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition

Yi Jia; Rou Gang Tang; Wei Er Lu; You Tong Fang; Yang Xia

doi:10.4028/www.scientific.net/MSF.817.466

Paper Titles

Dynamic Recrystallization Behavior of a New Lead-Free Machinable Brass during Hot Deformation
p.444

Microstructure, Corrosion and Wear Resistance of Co-Ni-ZrO₂ Composite Coating
p.449

Effect of Ausforming Temperature on Bainite Transformation of High Carbon Low Alloy Steel
p.454

Influence of Magnetic Field on the Microstructure and Properties of Cu-Ag-Zr Alloy
p.460

TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
p.466

Heat Treatment of 10Cr12Ni3Mo2VN Blade Steel for Ultra Supercritical Unit
p.472

Influence of SiC Content and Heat Treatment on the Corrosion Resis-Tance and Oxidation Resistance of Ni-P-SiC Composite Coating
p.479

Effect of Sample Size on Microstructure and Mechanical Properties of OFHC Copper Processed by Equal Channel Angular Pressing
p.484

Effects of Heat Treatment on Mechanical Properties of Ni-P-CNT Composite Coating
p.493

HomeMaterials Science ForumMaterials Science Forum Vol. 817TiN/AlN Nano Multilayers Film Fabricated by Plasma...

TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition

Abstract:

TiN/AlN nanomultilayers were fabricated by plasma enhanced atomic layer deposition (PEALD). The multi-layers were characterized by HRSEM, XRD, EDS and nanoIndenter. The results showed that TiN/AlN nanomultilayers had a good periodic modulation structure, but with quite a lot of O and C contamination which were brought from PEALD process. The O and C contamination impede the crystallization of TiN, leading to a poor hardness of these nanomultilayers. No super-hardness phenomenon was identified based on Koehler theory. Much more attention needs to be paid on decreasing the O and C contamination in PEALD process.

You might also be interested in these eBooks

View Preview

Info:

Periodical:

Materials Science Forum (Volume 817)

Pages:

466-471

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.817.466

Citation:

Cite this paper

Online since:

April 2015

Authors:

Yi Jia, Rou Gang Tang, Wei Er Lu, You Tong Fang, Yang Xia

Keywords:

Hardness, Nano Multilayers, PEALD, TiN/AlN

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

Citation:

References

[1] J.S. Koehler: Phys. Rev. B. 2(1970) 547-551.

Google Scholar

[2] K.K. Shih and D.B. Dove: Appl. Phys. Let. 61(1992) 654-656.

Google Scholar

[3] T. Wu: J. Appl. Phys. 53(1982) 5265.

Google Scholar

[4] G.Y. Li, X.R. Shi, L. Wu, J. H. Xu, Y.H. Rong and H. J. Zhang: J. Mat. Eng. 11(1999) 6-9, 13.

Google Scholar

[5] S.H. Yao, Y. L. Su, W.H. Kao and T.H. Liu: Tribology International. 39(2006) 332-341.

Google Scholar

[6] S.H. Yao: Surf. Coat. Tech. 197(2005) 351-357.

Google Scholar

[7] P. Sun, C. Su, T. Liu, C. Hsu and C. Lin: J. Alloys Comp. 509(2011) 3197-3201.

Google Scholar

[8] D. Kim, T. Seong and Y. Baik: Surf. Coat. Tech. 153(2002) 79-83.

Google Scholar

[9] S. H. Yao, Y. L. Su, W.H. Kao and T.H. Liu: Mat. Sci. Eng. A. 392 (2005) 340-347.

Google Scholar

[10] Y.D. Pa, M. C. Deng, S. H. Chen, W. Xiang, X. G. Li, X. J. Wu: J. Wuhan University of Science and Technology (Natural Sci. Ed. ). 31(2008) 312-315.

Google Scholar

[11] V. Miikkulainen, M. Leskela, M. Ritala and R. L. Puurunen: J. Appl. Phys. 113 (2013) 021301-1-101.

Google Scholar

[12] S. B. S. Heil, J. L. van Hemmen, M.C.M. van de Sanden and W. M. M. Kessels: J. Appl. Phys. 103 (2008) 103302-1-14.

Google Scholar

[13] H. B. Profijt, P. Kudlacek, M.C.M. van de Sanden and W. M. M. Kessels: J. Electrochem. Soc. 158 (2011) G88-G91.

DOI: 10.1149/1.3552663

Google Scholar

[14] H. B. Profijt, M. C. M. van de Sanden and W.M.M. Kessels: Electrochem. Solid-State Lett. 15 (2012) G1-G3.

Google Scholar

[15] H. B. Profijt , M. C. Main de Sanden and W.M.M. Kassel: J. Vac. Sci. Technol. A. 31 (2013) 01A106-1-8.

Google Scholar

[16] W. J. Zhao, Y. R. Li, Z. G. Hu, H. Cu, X. F. Zhu, G.Y. Li: Surf. Tech. 34 (2005) 19-21.

Google Scholar