Pressure Dependence of Formation and Migration Enthalpies for Atomic Diffusion in Si: Conjugate Gradient Minimization of Total Energy

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Periodical:

Materials Science Forum (Volumes 83-87)

Edited by:

Gordon Davies, G.G. DeLeo and M. Stavola

Pages:

469-474

DOI:

10.4028/www.scientific.net/MSF.83-87.469

Citation:

O. Sugino and A. Oshiyama, "Pressure Dependence of Formation and Migration Enthalpies for Atomic Diffusion in Si: Conjugate Gradient Minimization of Total Energy", Materials Science Forum, Vols. 83-87, pp. 469-474, 1992

Online since:

January 1992

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$35.00

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