Effective Sputtering System for Deposition of Wear-Resistant and Anticorrosion Coatings

Aleksander Sergeevich Metel; S.N. Grigoriev; Vasilii Petrovich Bolbukov; Yury Andreevich Melnik

doi:10.4028/www.scientific.net/MSF.834.61

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HomeMaterials Science ForumMaterials Science Forum Vol. 834Effective Sputtering System for Deposition of...

Effective Sputtering System for Deposition of Wear-Resistant and Anticorrosion Coatings

Abstract:

Results of a target sputtering investigation have been obtained, the target being positioned on the bottom of a cylindrical hollow cathode covered by a grid. It was shown that influence on the glow discharge of a nonuniform magnetic field with lines crossing the target center as well as the grid, the hollow cathode and the target periphery, where the field lines are arc-shaped, depends on the magnetic induction on the target edge. Due to ionization by electrons emitted by the cathode and forced by the magnetic field to approach to the target more frequently the plasma density near the target grows up and more than a half of all ions produced in the discharge quite uniformly sputter the target

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Periodical:

Materials Science Forum (Volume 834)

Pages:

61-70

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.834.61

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Online since:

November 2015

Authors:

Aleksander Sergeevich Metel, S.N. Grigoriev, Vasilii Petrovich Bolbukov, Yury Andreevich Melnik

Keywords:

Electrons, Electrostatic Confinement, Glow Discharge, High-Energy Mole-Cules, Ions, Multiplication Metal Atoms

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References

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