Influence of Microstructure on Pass through Flux of High Purity Ni

Abstract:

Pass through flux (PTF) is an essential parameter for the magnetron sputtering process of ferromagnetic materials. In the present investigation the influence of deformation, recrystallized microstructure and thickness on PTF of Ni was examined by the analysis of microstructure and hardness of high purity Ni. The experimental results showed that PTF of rolled Ni increased significantly comparing to the annealing microstructure that is related to the dislocation and stress of microstructure. With the recrystallization and grain growth of deformed samples, PTF decreased to be about 30%. PTF was also associated with the thickness of material. It increased by 6% when the thickness of 0.5mm decreased. This research is useful to guide and improve the design, development and preparation of magnetic sputtering materials.

• Periodical: Materials Science Forum (Volume 848)
• Pages: 696-702
• DOI: https://doi.org/10.4028/www.scientific.net/MSF.848.696
• Online since: March 2016
• Authors: Guo Jin Xu, Jun Feng Luo, Yong Jun Li, Jin Jiang He, Xiao Yong Wan, Zhao Chong Ding
• Keywords: Ferromagnetism, High Purity Ni, Magnetron Sputtering, Microstructure, PTF

References

[1] D.K. Han, Q.C. Chen, J.Q. Wang, Design of magnetic circuit of magnetron sputtering target, VACUUM. 44 (2007) 14-17.

[2] Heraeus, Inc, U. S. Patent 006514358B1. (2003).

[3] Nippon Mining & Metal Co., Ltd, U. S. Patent 7740718B2. (2010).

[4] Praxair S.T. Technology, Inc., U.S. Patent 6190516B1. (2001).

[5] W.J. Xu, Recent developments and applications in magnetron sputtering, Modern Instruments. 11 (2005) 1-5.

[6] W.M. Yang, Y.W. Liu, L.X. Xu, etc. Review of film growth by sputtering technology, Journal of Vacuum Science and Technology (CHINA). 25 (2005) 204-205.

[7] Z. Liu, The Calculation of Electromagnetic Distribution and Particle Movement in Magnetron Sputtering Equipment, Hefei University of Technology, He Fei, (2007).

[8] C.S. Yang, H.F. Cheng, G.P. Tang, etc. Review of ferromagnetic targets for magnetron sputtering, Journal of Vacuum Science and Technology (CHINA). 25 (2005) 372-377.

[9] ASTM F1761-00, Standard Test Method for Pass Through Flux of Circular Magnetic Sputtering Targets, ASTM International, (2005).

[10] General Research Institute for Nonferrous Metals, Grikin Advanced Materials Co. Ltd, China Patent 200920350675. 3. (2010).

[11] General Research Institute for Nonferrous Metals, Grikin Advanced Materials Co. Ltd, China Patent 200620134206. 4. (2007).

[12] G.X. Hu, X. Cai, Y.H. Rong, Fundamentals of Materials Science, third ed., Shang Hai Jiao Tong University Press, Shang Hai, (2010).

[13] L.H. Zhang, Y. An, The qualitative analysis of the structure of the magnetism farmland as source of the minimum energy principle, Journal of Hebei Institute of Technology. 27 (2005) 105-121.

[14] X. Chen, Basic Research about Mechanism of Magnetic Memory Method, Nan Chang Hang Kong University, Nan Chang, (2007).

[15] J.J. Liu, The influence of the residual stress on magnetic property of soft magnetic materials, Hangkong Bingqi. (2004) 28-31.

[16] M.X. Xu, Research on The Magnetic Effects of Ferromagnetic Material in The Process of Fatigue, Harbin Institute of Technology, Harbin, (2012).