Design and Optimization of the Monochromator for the New Residual Stress Diffractometer

Xiao Long Liu; Yun Tao Liu; Song Bai Han; Dong Feng Chen; Mei Juan Li; Yu Qing Li; Jian Bo Gao; Lin Feng Yang

doi:10.4028/www.scientific.net/MSF.850.148

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HomeMaterials Science ForumMaterials Science Forum Vol. 850Design and Optimization of the Monochromator for...

Design and Optimization of the Monochromator for the New Residual Stress Diffractometer

Abstract:

The monochromator for the new residual stress diffractometer at China Advanced Research Reactor (CARR) was simulated and optimized using SIMRES software. Objected the Fe (211) diffraction peak, the effect of horizontal and vertical curvature of Si (400) monochromator on Figure of Merit was studied to optimize the focusing parameters. With the optimal focusing condition, the influence of wafer thickness, number of wafers, packet height and gap of packets on performance of instrument was calculated consequently and the corresponding geometrical size was fixed. Finally, the design of the monochromator for the new residual stress diffractometer at CARR was completed.

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Periodical:

Materials Science Forum (Volume 850)

Pages:

148-152

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.850.148

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Online since:

March 2016

Authors:

Xiao Long Liu, Yun Tao Liu, Song Bai Han, Dong Feng Chen, Mei Juan Li, Yu Qing Li, Jian Bo Gao, Lin Feng Yang

Keywords:

Double Focusing Monochromator, Figure of Merit, New Residual Stress Diffractometer, SimRes Simulation

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