High-Temperature Sulfidation of SUS316L, TiN, and CrN Thin Films in (N2/3.1%H2O/2.42%H2S)-Mixed Gas

Min Jung Kim; Seok Woo Chung; Dong Bok Lee

doi:10.4028/www.scientific.net/MSF.860.101

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HomeMaterials Science ForumMaterials Science Forum Vol. 860High-Temperature Sulfidation of SUS316L, TiN, and...

High-Temperature Sulfidation of SUS316L, TiN, and CrN Thin Films in (N₂/3.1%H₂O/2.42%H₂S)-Mixed Gas

Abstract:

SUS316L, TiN and CrN films were corroded at 500 °C for up to 30 h in 1 atm of (N₂/3.1%H₂O/2.42%H₂S)-mixed gas. SUS316L displayed poor corrosion resistance due to the formation of FeS. It corroded to (Fe, Ni)-mixed sulfides and FeS, forming highly fragile, porous, and nonadherent scales. TiN and CrN films suppressed the sulfidation of SUS316L.