Optimization of Diamond-Like Carbon Thin Film on Copper Substrate for Carbon Nanotubes Synthesis by ACVD Technique

Chotika Suttichart; Dheerawan Boonyawan; Wim Nhuapeng; Wandee Thamjaree

doi:10.4028/www.scientific.net/MSF.883.65

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HomeMaterials Science ForumMaterials Science Forum Vol. 883Optimization of Diamond-Like Carbon Thin Film on...

Optimization of Diamond-Like Carbon Thin Film on Copper Substrate for Carbon Nanotubes Synthesis by ACVD Technique

Abstract:

In this research, demonstrate plasma treatment on copper substrate by Radio Frequency Plasma (RF) using a mixture of 70%C₂H₂ + 30%H₂ as the working gases. The plasma exposure time were varied from 10, 20 and 30 min under the electrical power of 50 Watts for synthesizing the diamond-like carbon (DLC) thin film on copper substrate. Thereafter, the substrates were used for synthesizing the carbon nanotubes (CNTs) via alcohol chemical vapor deposition technique (ACVD). It could be found that the plasma treatment for 10 min exhibited the small contact angle less than those of substrates treated with 20, 30 min and untreated sample which relate to the hydrophilic and affect to improve the adhesion and distribution of catalyst on substrate. The roughness of DLC film showed the different high and low level like hillock. After that, the 10 min treatment time sample was used for synthesizing the CNTs and the results found that the obtained CNTs showed good distribution on substrate.

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Periodical:

Materials Science Forum (Volume 883)

Pages:

65-69

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.883.65

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Online since:

January 2017

Authors:

Chotika Suttichart, Dheerawan Boonyawan, Wim Nhuapeng, Wandee Thamjaree*

Keywords:

Carbon Nanotubes, Diamond-Like Carbon Thin Film, Radio Frequency Plasma

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