Lateral Size of Self-Patterned Nanostructures Controlled by Multi-Step Deposition

Abstract:

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Self-patterning presents an appealing alternative to lithography for the production of arrays of nanoscale ferroelectric capacitors for use in high density non-volatile memory devices. Recently a self-patterning method, based on the use of the instability of ultrathin films during hightemperature treatments, was used to fabricate nanosized ferroelectrics. This paper reports the use of the method for the preparation of PZT nanoislands on different single crystalline substrates - SrTiO3, MgO and LaAlO3. Moreover, a multi-step deposition procedure in order to control lateral the dimension of the crystals was introduced. The nanostructures obtained were studied by atomic force microscopy, scanning electron microscopy and X-ray diffraction.

Info:

Periodical:

Solid State Phenomena (Volume 106)

Edited by:

Radu Robert Piticescu, Witold Lojkowski and John R. Blizzard

Pages:

117-122

DOI:

10.4028/www.scientific.net/SSP.106.117

Citation:

I. Szafraniak et al., "Lateral Size of Self-Patterned Nanostructures Controlled by Multi-Step Deposition ", Solid State Phenomena, Vol. 106, pp. 117-122, 2005

Online since:

September 2005

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Price:

$35.00

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