Lateral Size of Self-Patterned Nanostructures Controlled by Multi-Step Deposition
Self-patterning presents an appealing alternative to lithography for the production of arrays of nanoscale ferroelectric capacitors for use in high density non-volatile memory devices. Recently a self-patterning method, based on the use of the instability of ultrathin films during hightemperature treatments, was used to fabricate nanosized ferroelectrics. This paper reports the use of the method for the preparation of PZT nanoislands on different single crystalline substrates - SrTiO3, MgO and LaAlO3. Moreover, a multi-step deposition procedure in order to control lateral the dimension of the crystals was introduced. The nanostructures obtained were studied by atomic force microscopy, scanning electron microscopy and X-ray diffraction.
Radu Robert Piticescu, Witold Lojkowski and John R. Blizzard
I. Szafraniak et al., "Lateral Size of Self-Patterned Nanostructures Controlled by Multi-Step Deposition ", Solid State Phenomena, Vol. 106, pp. 117-122, 2005