An Ultra-High Q Silicon Cantilever Resonator for Thin Film Internal Friction and Young's Modulus Measurements

Thomas H. Metcalf; Xiao Liu

doi:10.4028/www.scientific.net/SSP.184.325

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An Ultra-High Q Silicon Cantilever Resonator for Thin Film Internal Friction and Young's Modulus Measurements

Abstract:

An audiofrequency (8.5 kHz) cantilever resonator with an extremely low background internal friction (Q^-1≈2×10^-8) at liquid helium temperatures has been developed. Above 30 K, the Q of the resonator is dominated by thermoelastic loss; Q^-1 is nearly exactly described by Zener’s formula for thermoelastic damping. Below 30 K, Q^-1decreases monotonically with decreasing temperature, reaching a typical baseline of Q^-1=1.5×10^-8at 400 mK.

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Internal Friction and Mechanical Spectroscopy

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Periodical:

Solid State Phenomena (Volume 184)

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325-330

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.184.325

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Online since:

January 2012

Authors:

Thomas H. Metcalf, Xiao Liu

Keywords:

Internal Friction Experimental Technique, Ultra-High Q Resonator, Young's Modulus

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References

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