Study of Biopolymer Chitosan as Resist for Submicron Electronic Lithography

Sergey S. Voznesenskiy; Aleksandr Nepomnyaschiy; Y.N. Kulchin

doi:10.4028/www.scientific.net/SSP.213.180

Paper Titles

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Protective Properties of the Nanocomposite Coatings on Mg Alloy
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Study of Biopolymer Chitosan as Resist for Submicron Electronic Lithography
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Photodynamic Effects in Nanocomposites Based on Quantum Dots of Cadmium Sulfide Embedded in a Silicate Matrix, in their Interaction with the Laser Beam
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Сurrent Source Based on Photoelectric Effect with Enhanced Efficiency
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High Anionic Conductivity of Solids with Different Structure
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HomeSolid State PhenomenaSolid State Phenomena Vol. 213Study of Biopolymer Chitosan as Resist for...

Study of Biopolymer Chitosan as Resist for Submicron Electronic Lithography

Abstract:

This paper presents the results of the study of polysaccharide chitosan as a new resist for electronic lithography for direct formation of mesostructures in submicron range. Film-forming properties of chitosan allow enough simply to obtain coatings with a thickness of tens to hundreds of nanometers. Furthermore, the optical and sensor characteristics of the films of various ionic forms of chitosan are well investigated, so it makes possible to form on their basis integrally optical functional structures.

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Periodical:

Solid State Phenomena (Volume 213)

Pages:

180-185

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.213.180

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Online since:

March 2014

Authors:

Sergey S. Voznesenskiy*, Aleksandr Nepomnyaschiy, Y.N. Kulchin

Keywords:

Biopolymer Chitosan, Electronic Lithography, Electronic Resist

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