Effect of Substrate RF-Bias on Exchange Coupling in Fe₂₀Ni₈₀/Fe₅₀Mn₅₀ Films

Abstract:

The effect of physical and technological factors on the effectiveness of the exchange coupling in two-layer film structures such as Fe₂₀Ni₈₀/Fe₅₀Mn₅₀ has been investigated. The dependences of the coercive force and the exchange bias field of permalloy layer on presence of a buffer Ta layer and its thickness, the order of sputtering and the thickness of Fe₂₀Ni₈₀ and Fe₅₀Mn₅₀ layers, substrate temperature and the features of radio-frequency (RF) substrate bias during deposition were investigated. It has been found that the substrate RF bias improves homogeneity of microstructure and reduces the surface roughness of permalloy layer. This in turn increases the magnetic pinning of permalloy layer and creates the prerequisites for the practical application of layered structures with higher thickness of the ferromagnetic layers.

• Periodical: Solid State Phenomena (Volume 215)
• Pages: 278-283
• DOI: https://doi.org/10.4028/www.scientific.net/SSP.215.278
• Online since: April 2014
• Authors: Alexander N. Gor'kovenko*, V.N. Lepalovskij, V.O. Vas’kovskiy, Peter A. Savin, Nina N. Shchegoleva
• Keywords: Exchange Coupling, Substrate Bias

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