[1]
H. Sirringhaus, T. Kawase and R. H. Friend. High-resolution Ink-jet Printing of All-polymer Transistor Circuits, MRS Bulletin 26:539-543(2001).
DOI: 10.1557/mrs2001.127
Google Scholar
[2]
M. Suzui, S. Tokito, and Y. Taga: Mater. Sci. Eng B Vol. 51 (1998), pp.66-71.
Google Scholar
[3]
S. Mondal : J. Phys. Sci. Vol. 12 (2009), pp.221-229.
Google Scholar
[4]
George, J. Preparation of Thin Films. Marcel Dekker Inc, New York(1992).
Google Scholar
[5]
Le-Zhong Li, Long Peng, Xing-Hua Zhu, and Ding-Yu Yang : JESTC Vol. 10 (2012), pp.8-92.
Google Scholar
[6]
Smith, D. L. Thin Film Deposition. Mc Graw-Hill Inc, Washington D.C.(1995).
Google Scholar
[7]
K. Kato, H. Omoto, T. Tomioka and A. Takamatsu : Thin Solid Films Vol. 520 (2011), pp.110-116.
DOI: 10.1016/j.tsf.2011.06.061
Google Scholar
[8]
K. F. Teng and R. W. Vest. Liqiud Ink Jet Printing with Mod Inks for Hybrid Microcircuits.IEEE Transactions on Components, Hybrids and Manufacturing Technology. 545-549 (1987).
DOI: 10.1109/tchmt.1987.1134794
Google Scholar
[9]
Ramanathan, S. Thin Film Metal-Oxides. Harvard University: Springer New York Dordrecht Heidelberg London, London(2010).
Google Scholar
[10]
Ai, Y., Liu, Y., Cui, T., and Varahramyan : Thin Solid Films Vol. 450 (2004), pp.312-31.
Google Scholar
[11]
I. D. Samadashvili, V. S.Varazashvili, T. E. Machaladze and T. A. Pavlenishvili : Inorg. Mater. Vol. 38 (2002), p.1186–1188.
DOI: 10.1023/a:1020987104575
Google Scholar
[12]
C. Yao, Q. Zeng, G.F. Goya, T. Torres, J. Liu, H. Wu, M. Ge, Y. Zeng, Y. Wang and J.Z. Jiang : J. Phys. Chem. C Vol. 111 (2007), p.12274–12278.
DOI: 10.1021/jp0732763
Google Scholar
[13]
J. Darul and W. Nowicki : Radiat. Phys. Chem. Vol. 78 (2009), p.S109–S111.
Google Scholar
[14]
K. Maria, S. Choudhury and M. Hakim : Int. Nano Lett. Vol. 3 (2013), p.1–10.
Google Scholar
[15]
A. Manikandan, V.J. Judith, L.J. Kennedy and M. Bououdina : J. Mol. Struct. Vol. 1035 (2013), p.332–340.
Google Scholar
[16]
ArunMajumdar : Science Vol. 303 (2004), pp.777-778.
Google Scholar
[17]
J.Gao, Y. Cui, and Z. Yang : Mater. Sci. Eng. B Vol. 110(2004), p.111–114.
Google Scholar
[18]
Ravinder, D : J Alloys Compd Vol. 291(1999), pp.208-214.
Google Scholar
[19]
Zhang, Z., Bao, C., Yao, W., Ma, S., Zhang, L., and Hou, S. : Superlattices Microstruct. Vol. 49(2011), pp.44-653.
Google Scholar
[20]
M. Ajmal and A. Maqsood : J. Alloy Compd. Vol. 460 (2008), p.54–59.
Google Scholar
[21]
Yang, W., Rossnagel, S. M., and Joo, J., The effects of impurity and temperature for transparent conducting oxide properties of Al:ZnO deposited by dc magnetron sputtering. Vacuum, 86(10):1452-1457 (2012).
DOI: 10.1016/j.vacuum.2012.02.025
Google Scholar
[22]
K. Verma, A. Kumar and D. Varshney : Curr. Appl. Phys. Vol.13 (2013), p.467–473.
Google Scholar
[23]
J. Li, H. Yuan, G. Li, Y. Liu and J. Leng : J. Magn. Magn. Mater. Vol. 322 (2010), p.3396–3400.
Google Scholar
[24]
Bhan, R. and Dhar, V. : Semicond. Sci. Technol Vol. 19(2004), pp.413-416.
Google Scholar