Thermal and Electrical Characterization of Zn-Cu Ferrites Thin Films

Article Preview

Abstract:

The effects of Zn and Cu on the thermoelectric properties of ferrite thin films were studied in this paper. The Zn-Cu ferritethin film was fabricated using ink-jet printing method. A minimum of 50 print cycles was required to obtain continuous film with approximately 9 μm thick thin films. The thickness of Zn-Cu ferrite thin films was decreased with increasing sintering temperature from 200 oC (9.21 μm) to 400 oC (5.48 μm). The XRD traces of ZnxCu1-xFe2O4 exhibit as plane reflection for cubic spinel phase of ZnxCu1-xFe2O4 and there were no impurity peaks detected with increasing Zn content and sintering temperature. The electrical conductivity of ZnxCu1-xFe2O4 thin film decreased from 1.18x10-3 S/cm (x=0.0) to 0.48x10-3 S/cm (x=1.0) with increasing Zn content. Positive Seebeck values were observed for all the samples, which indicated the samples were p-type. The Seebeck coefficient of ZnxCu1-xFe2O4 thin film increased from 6.36 μV/K (x=0.0) to 17.46 μV/K (x=1.0) with increasing Zn content.

You might also be interested in these eBooks

Info:

Periodical:

Solid State Phenomena (Volume 280)

Pages:

90-95

Citation:

Online since:

August 2018

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2018 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

* - Corresponding Author

[1] H. Sirringhaus, T. Kawase and R. H. Friend. High-resolution Ink-jet Printing of All-polymer Transistor Circuits, MRS Bulletin 26:539-543(2001).

DOI: 10.1557/mrs2001.127

Google Scholar

[2] M. Suzui, S. Tokito, and Y. Taga: Mater. Sci. Eng B Vol. 51 (1998), pp.66-71.

Google Scholar

[3] S. Mondal :  J. Phys. Sci. Vol. 12 (2009), pp.221-229.

Google Scholar

[4] George, J. Preparation of Thin Films. Marcel Dekker Inc, New York(1992).

Google Scholar

[5] Le-Zhong Li, Long Peng, Xing-Hua Zhu, and Ding-Yu Yang : JESTC Vol. 10 (2012), pp.8-92.

Google Scholar

[6] Smith, D. L. Thin Film Deposition. Mc Graw-Hill Inc, Washington D.C.(1995).

Google Scholar

[7] K. Kato, H. Omoto, T. Tomioka and A. Takamatsu : Thin Solid Films Vol. 520 (2011), pp.110-116.

DOI: 10.1016/j.tsf.2011.06.061

Google Scholar

[8] K. F. Teng and R. W. Vest. Liqiud Ink Jet Printing with Mod Inks for Hybrid Microcircuits.IEEE Transactions on Components, Hybrids and Manufacturing Technology. 545-549 (1987).

DOI: 10.1109/tchmt.1987.1134794

Google Scholar

[9] Ramanathan, S. Thin Film Metal-Oxides. Harvard University: Springer New York Dordrecht Heidelberg London, London(2010).

Google Scholar

[10] Ai, Y., Liu, Y., Cui, T., and Varahramyan : Thin Solid Films Vol. 450 (2004), pp.312-31.

Google Scholar

[11] I. D. Samadashvili, V. S.Varazashvili, T. E. Machaladze and T. A. Pavlenishvili : Inorg. Mater. Vol. 38 (2002), p.1186–1188.

DOI: 10.1023/a:1020987104575

Google Scholar

[12] C. Yao, Q. Zeng, G.F. Goya, T. Torres, J. Liu, H. Wu, M. Ge, Y. Zeng, Y. Wang and J.Z. Jiang : J. Phys. Chem. C Vol. 111 (2007), p.12274–12278.

DOI: 10.1021/jp0732763

Google Scholar

[13] J. Darul and W. Nowicki : Radiat. Phys. Chem. Vol. 78 (2009), p.S109–S111.

Google Scholar

[14] K. Maria, S. Choudhury and M. Hakim : Int. Nano Lett. Vol. 3 (2013), p.1–10.

Google Scholar

[15] A. Manikandan, V.J. Judith, L.J. Kennedy and M. Bououdina : J. Mol. Struct. Vol. 1035 (2013), p.332–340.

Google Scholar

[16] ArunMajumdar : Science Vol. 303 (2004), pp.777-778.

Google Scholar

[17] J.Gao, Y. Cui, and Z. Yang : Mater. Sci. Eng. B Vol. 110(2004), p.111–114.

Google Scholar

[18] Ravinder, D : J Alloys Compd Vol. 291(1999), pp.208-214.

Google Scholar

[19] Zhang, Z., Bao, C., Yao, W., Ma, S., Zhang, L., and Hou, S. : Superlattices Microstruct. Vol. 49(2011), pp.44-653.

Google Scholar

[20] M. Ajmal and A. Maqsood : J. Alloy Compd. Vol. 460 (2008), p.54–59.

Google Scholar

[21] Yang, W., Rossnagel, S. M., and Joo, J., The effects of impurity and temperature for transparent conducting oxide properties of Al:ZnO deposited by dc magnetron sputtering. Vacuum, 86(10):1452-1457 (2012).

DOI: 10.1016/j.vacuum.2012.02.025

Google Scholar

[22] K. Verma, A. Kumar and D. Varshney : Curr. Appl. Phys. Vol.13 (2013), p.467–473.

Google Scholar

[23] J. Li, H. Yuan, G. Li, Y. Liu and J. Leng : J. Magn. Magn. Mater. Vol. 322 (2010), p.3396–3400.

Google Scholar

[24] Bhan, R. and Dhar, V. : Semicond. Sci. Technol Vol. 19(2004), pp.413-416.

Google Scholar