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HomeSolid State PhenomenaSolid State Phenomena Vols. 51-52Growth of Polycrystalline Silicon Films at High...

Growth of Polycrystalline Silicon Films at High Deposition Rate and Low Temperature by Hot Wire Chemical Vapour Deposition

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Polycrystalline Semiconductors IV

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Periodical:

Solid State Phenomena (Volumes 51-52)

Pages:

255-260

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.51-52.255

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Online since:

May 1996

Authors:

A.R. Middya, J. Guillet, J.E. Bouree, J. Perrin

Keywords:

Electrical Properties, Hot Wire Chemical Vapour Deposition, Structural Property

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© 1996 Trans Tech Publications Ltd. All Rights Reserved

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