Properties of TiO2 Films Prepared by the Spray Pyrolysis Method
TiO2 thin films were prepared by spray pyrolysis method. The solution containing titanium(IV)isopropoxide, acetylacetone and ethanol was deposited onto n-type Si(100) and HD Si(100) wafers at substrate temperatures of 315 to 500 0C by pulsed spray solution feed. The films were characterized by FTIR, XRD, AFM, ellipsometry, impedance and I-V measurements. Asdeposited films prepared below 500 0C were amorphous, whereas crystalline films could be achieved at 500 0C. Subsequent annealing at 700 °C in air led to crystalline anatase formation for films deposited below 400 °C. Rutile phase appears in annealed films prepared at a growth temperature above 400 °C. Anatase TiO2 films show refractive index in the range 2.20 to 2.40 and exhibit a relative dielectric constant value of 75 in the range 1 to 100 kHz. Electric breakdown occurs for 120 nm thick film at 250 kV/cm.
Witold Lojkowski and John R. Blizzard
I. Oja et al., "Properties of TiO2 Films Prepared by the Spray Pyrolysis Method", Solid State Phenomena, Vols. 99-100, pp. 259-264, 2004