Fabrication of GaSb Microlenses by Photo and E-Beam Lithography and Dry Etching
Fabrication of surface-relief microstructures in GaSb for application in mid-infrared optoelectronic devices is described. Photo- and e-beam lithography was used to define patterns on GaSb surfaces. Ar/O2 sputter etching and RIE in BCl3-based plasma were applied to transfer preshaped master into the GaSb substrate. Circular microlenses with an aspect ratio (height to diameter) 0.4/10 µm and circular gratings with 0.4 µm linewidth / 1 µm period and 1.7 µm depth have been demonstrated.
Witold Lojkowski and John R. Blizzard
E. Papis et al., "Fabrication of GaSb Microlenses by Photo and E-Beam Lithography and Dry Etching", Solid State Phenomena, Vols. 99-100, pp. 83-88, 2004