Search results

One of the approaches to reduce the photocatalytic activity of ZnO is by doping impurity in ZnO.
These diffraction peaks could be indexed to a hexagonal wurtzite structure (JCPDS Card No.36-1451) with lattice constant a = 0.3249 nm and c = 0.5205 nm.
ZnO NRs (at%) 10 mins.
B A Undoped ZnO NRs Fe-doped ZnO NRs Fig. 7: Degradation of RhB solution after 1 hour UV irradiation (254 nm) in the presence of (a) Undoped ZnO NRs and (b) Fe-doped ZnO NRs (60 minutes).
Thus, the poor photodegradation efficiency was attributed to the limited number of trapped holes and electrons as most of the photogenerated electrons and holes were recombined and produced green emission.

Among them, ZnO has been receiving a lot of attention.
(a) (b) (d) (c) Fig. 1 – Surface micrographs obtained by confocal microscope of intrinsic ZnO(a), ZnO:Cu 1at.% (b), ZnO:Cu 5at.% (c), and ZnO:Cu 10at.% (d).
To identify the phases in the sample, the JCPDS standard cards #00-036-1451 and #01-072-2032 were used.
Fig. 2 – X-ray diffractograms of the ZnO:Cu films.
This occurs with the increase of doping element in the ZnO matrix, increasing also the number of absorption centers; thus, increasing light absorption capacity [4].

The hardener was mixed to the ZnO composite by the composition of 2: 1.
Padmaraj et. al [15] reported that the ZnO filler enhanced ionic transfer number from 92 to 95% of solid polymer electrolyte.
In this study, ZnO composited was prepared by mixing ZnO powder with epoxy resin via chemical solution mixing.
These results are in a good agreement with JCPDS card no. 98-015-4487 and previous reported [12].
XRD pattern showed that crystal structure of ZnO composite was appeared in the ZnO composite and it had a polycrystalline hexagonal wurtzite structure.

Currently, ZnO nanostructures are being used worldwide.
Quite a number of ZnO nanostructures can be fabricated using hydrothermal method, with slight variations in the precursor concentrations, deposition temperatures and times.
This study involves growing well-aligned ZnO nanorods with uniform diameters on a ZnO seed layer covered FTO substrate.
The ZnO seed layer to induce the growth of ZnO nanorods in the aqueous solution.
These diffraction peaks and relative intensities match Joint Committee on Powder Diffraction Standards (JCPDS) card no. 067454.

A new form of composite PCMs is developed by adding 0.5 wt% of SiO2, TiO2, ZnO and CuO nanomaterials to lauric acid.
While numerous prior studies have concentrated on enhancing the thermal characteristics of PCMs by incorporating various nanomaterials in different mass fractions, a limited number have explored the potential of SiO2, TiO2, ZnO and CuO nanomaterials to enhance PCM performance.
Synthesis of ZnO nanoparticle Zinc oxide (ZnO) was synthesized using the Sol-gel process as follows: Initially, 0.1 M of zinc acetate was dispersed in 55 ml of ethanol and stirred for 50 minutes with a magnetic stirrer operating at 700 rpm.
FESEM images: (a) SiO2, (b) TiO2, (c) ZnO and (d) CuO Furthermore, Figure 2 presents X-ray diffraction (XRD) patterns for SiO2, TiO2, ZnO and CuO nanomaterials, which match well with the standard JCPDS card references (SiO2: 850335, TiO2: 29-1360, 21-1276, 21-1272, ZnO: 01-089-0511, 01-089-5898), verifying the identity of these materials as SiO2, TiO2, ZnO and CuO NPs from the JCPDS source.
XRD pattern of SiO2, TiO2, ZnO and CuO nanomaterial 3.2.

Fluids included ZnO nanoparticles and quantum dots nanostructures (QDOTs ZnO) could effectively decrease the n-decane/water interfacial tension and air/water surface tension.
A number of works have been previously reported around the presence, adsorption, and self-assembly of nanoparticles at the interfaces [8,9].
Results and Discussion SEM and XRD data of ZnO nanoparticles Fig. 1 shows typical SEM images of various ZnO nanostructure morphologies.
(A) uniformed nanospherical ZnO(1), (B) QDs nanorods of ZnO(2), (C) nanospherical ZnO(3) and (D) ZnO(4) nanoparticles
Fig. 2 XRD pattern of nanospherical ZnO(1) containing Wurtzite structure with hexagonal phase according to JCPDS card no. 36-1451.

The peaks corresponding to the reflections from the GIXRD study are in good agreement with the JCPDS data (Card No.79-0208).
The bond length [33] calculated from the lattice parameter are in good agreement with JCPDS data.
The obtained grain sizes for Al doped ZnO are smaller than the pure ZnO.
It is found that the packing density is more in the case of aluminium doped zinc oxide for Al 1-1.5 % and less number of grain boundaries.
Matsushima, Electrical and optical properties of ZnO films prepared by sputtering of ZnO targets containing AlN Appl.

The semicrystalline polymer PVdF posses a higher dielectric constant that assist greater dissociation of lithium salt thus providing more number of charge carriers.
The milled powders were calcinated in air at 400○ C for 2 h to get nano ZnO [4].
Fig1. shows the diffraction pattern of synthesized ZnO nanoparticles.
The diffraction peaks located at 31.8○, 34.5○, 36.3○, 47.6○, 56.7○, 62.9○, 68.1○ and 69.1○ indexed as hexagonal wurtzite phase of ZnO (JCPDS card no: 36-1451).
The porous region are the plasticizer rich region that aids ion mobility, the film with filler has larger number of pores and micro pores capable of trapping higher plasticizer-rich phase and it is reflected in the conductivity studies.

Structural and Optical Studies of Molarity Based ZnO Thin Films A.
From the XRD data, it can be seen that all samples are polycrystalline with the hexagonal wurtzite structure [4] (P63mc space group, JCPDS card no:36-1451).
It may be observed that there are three orientations identified as (100),(002) and (101) planes at diffraction angles 31.79◦, 34.48◦, 36.30◦ for the samples with molarities from 0.025M to 0.075M.The number of peaks increases for 0.1M concentration.
The reflectance measured is minimum for 0.075M concentration of ZnO film.
Highest transmittance is exhibited by the ZnO film with molarity 0.075M.

The ZnO film was then annealed in the furnace at 500°C for 2 hour under ambient air to get the crystallization of ZnO.
The FTIR absorbance spectra were performed in the wave number range 400-4000cm-1.
ZnO films with IDE deposition process.
All the diffraction peaks in the result was according to the standard card (JCPDS 36-1451).
X-ray diffraction patterns of ZnO films Fig. 6 shows the FTIR spectra of the ZnO films after the annealing process.