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Online since: February 2022
The forum took place in Gifu, Japan, 24 years ago for the first time.
The overarching goal of this conference was to provide an international forum for the representation and discussion of research results in lubrication, friction, wear, and development of the tribological systems pertaining to manufacturing processes.
Three plenary lectures were given covering: (a) Advances in tribological coatings for superlubricity and ultra-high wear resistance, (b) An integrated experimental and molecular modelling approach to investigate tribological mechanics in hot rolling of metal, and (c) Overview of metal forming research in Indian Academia.
We would also like to extend our gratitude to authors who were devoted to advancing the understanding of tribological phenomena pertaining to a broad range of manufacturing processes.
These proceedings provide a record of efforts by international researchers working on tribology for manufacturing systems, and we hope that the presented articles will be helpful for you in searching for innovative engineering solutions.
The overarching goal of this conference was to provide an international forum for the representation and discussion of research results in lubrication, friction, wear, and development of the tribological systems pertaining to manufacturing processes.
Three plenary lectures were given covering: (a) Advances in tribological coatings for superlubricity and ultra-high wear resistance, (b) An integrated experimental and molecular modelling approach to investigate tribological mechanics in hot rolling of metal, and (c) Overview of metal forming research in Indian Academia.
We would also like to extend our gratitude to authors who were devoted to advancing the understanding of tribological phenomena pertaining to a broad range of manufacturing processes.
These proceedings provide a record of efforts by international researchers working on tribology for manufacturing systems, and we hope that the presented articles will be helpful for you in searching for innovative engineering solutions.
Online since: May 2009
The conference aims to be a bilateral forum for researchers to present
their latest findings and to exchange ideas in the field of ultra-precision machining.
This book selected papers from the submissions to the International Conference on Ultra-Precision Machining (CJICUPM2008), one of the academic conferences originated by Production Engineering Institution of Chinese Mechanical Engineering Society (CMES) and National Engineering Research Center for High Efficiency Grinding, Hunan University, held in Changsha, China, from 24 - 25 November, 2008.
The aim of the symposium is to be a bilateral forum for researchers to present their latest findings and to exchange ideas in the field of ultra-precision machining.
turning of other materials Ultra-precision grinding of optical materials or molding dies Ultra-precision grinding of hard materials Ultra-precision polishing of optical materials or molding dies Ultra-precision polishing of single crystals or chemical mechanical polishing Ultra-precision polishing of metals or alloys High speed machining technology and applications Ion beam figuring and polishing Electron beam patterning and polishing Ultra-precision laser machining Ultra-precision electro discharge machining Ultra-precision coating Glass molding and plastic injection molding of optical and electric components Fabrication of micro electro mechanical systems (MEMS) Ultra-precision machine tools New Ultra-precision machine and its machine elements Ultra-precision positioning and control Ultra-precision shape or surface roughness measurement New tools or new application of tools Other precision machining technology Advanced
It should also be particularly useful for practicing engineers in ultra-precision machining who are responsible for the efficient, precision and effective operations.
This book selected papers from the submissions to the International Conference on Ultra-Precision Machining (CJICUPM2008), one of the academic conferences originated by Production Engineering Institution of Chinese Mechanical Engineering Society (CMES) and National Engineering Research Center for High Efficiency Grinding, Hunan University, held in Changsha, China, from 24 - 25 November, 2008.
The aim of the symposium is to be a bilateral forum for researchers to present their latest findings and to exchange ideas in the field of ultra-precision machining.
turning of other materials Ultra-precision grinding of optical materials or molding dies Ultra-precision grinding of hard materials Ultra-precision polishing of optical materials or molding dies Ultra-precision polishing of single crystals or chemical mechanical polishing Ultra-precision polishing of metals or alloys High speed machining technology and applications Ion beam figuring and polishing Electron beam patterning and polishing Ultra-precision laser machining Ultra-precision electro discharge machining Ultra-precision coating Glass molding and plastic injection molding of optical and electric components Fabrication of micro electro mechanical systems (MEMS) Ultra-precision machine tools New Ultra-precision machine and its machine elements Ultra-precision positioning and control Ultra-precision shape or surface roughness measurement New tools or new application of tools Other precision machining technology Advanced
It should also be particularly useful for practicing engineers in ultra-precision machining who are responsible for the efficient, precision and effective operations.
Online since: August 2016
Authors: Carlos Maurício Fontes Vieira, Jonas Alexandre, Afonso Rangel Garcez de Azevedo, Gustavo de Castro Xavier, Sergio Neves Monteiro, Fabio de Oliveira Braga, Carla Bozzi Piazzarollo
Alberto Lamego, 2000, 28013-602, Campos dos Goytacazes, Brazil.
2 UENF - State University of the Northern Rio de Janeiro, LAMAV – Laboratory of Advanced Materials; Av.
Alberto Lamego, 2000, 28013-602, Campos dos Goytacazes, Brazil. 3IME - Military Institute of Engineering, Department of Materials Science, Praça General Tibúrcio, 80, 22290-270, Rio de Janeiro, Brazil.
All tests an experiment were carried out at the Laboratory of Civil Engineering, LECIV, in the Center of Science and Technology, CCT, of the state University of the Northern Rio de Janeiro, UENF, in Campos dos dos Goytacazes.
Forum Vols. 775-776 (2014), p. 69
Rethwisch: Material Science and Engineering: An Introduction.
Alberto Lamego, 2000, 28013-602, Campos dos Goytacazes, Brazil. 3IME - Military Institute of Engineering, Department of Materials Science, Praça General Tibúrcio, 80, 22290-270, Rio de Janeiro, Brazil.
All tests an experiment were carried out at the Laboratory of Civil Engineering, LECIV, in the Center of Science and Technology, CCT, of the state University of the Northern Rio de Janeiro, UENF, in Campos dos dos Goytacazes.
Forum Vols. 775-776 (2014), p. 69
Rethwisch: Material Science and Engineering: An Introduction.
Online since: February 2014
Preface
The 2013 International Forum on Computer and Information Technology (IFCIT 2013)
was held in Shenzhen, China, 24-25 December 2013.
The IFCIT2013 brought together scientists and researchers from 12 countries, affiliated with universities, technology centers and industrial firms to debate topics related to advanced technologies for computer application and information technology application, which would enhance the sustainable development of this field.
The technical papers included in this volume on the following topics: Databases, Data Processing and Data Management, Parallel and Distributed Computing, Computer Network Technology and Applications, Software Engineering, E-Commerce and E-Government, Multimedia Technology and Application, Computer Vision and Image Processing Technology, Artificial Intelligence, Intelligent Algorithms and Computational Mathematics, Computer Aided Design and Research, Communications Technology and Signal Processing, Electronic Devices and Embedded Systems, Intelligent Instruments, Techniques for Detection and Testing, Sensors and Measurement, Automation and Control, Information Technologies in Engineering Management, Enterprise Resource Planning and Management System, Information Technologies in Education, etc.
We sincerely hope that the 2013 International Forum on Computer and Information Technology is a significant step forward.
(ID: 212.3.110.94-03/03/14,10:09:30)2013 International Forum on Computer and Information Technology (IFCIT 2013) Conference Organization Co-Chairmen Prof.
The IFCIT2013 brought together scientists and researchers from 12 countries, affiliated with universities, technology centers and industrial firms to debate topics related to advanced technologies for computer application and information technology application, which would enhance the sustainable development of this field.
The technical papers included in this volume on the following topics: Databases, Data Processing and Data Management, Parallel and Distributed Computing, Computer Network Technology and Applications, Software Engineering, E-Commerce and E-Government, Multimedia Technology and Application, Computer Vision and Image Processing Technology, Artificial Intelligence, Intelligent Algorithms and Computational Mathematics, Computer Aided Design and Research, Communications Technology and Signal Processing, Electronic Devices and Embedded Systems, Intelligent Instruments, Techniques for Detection and Testing, Sensors and Measurement, Automation and Control, Information Technologies in Engineering Management, Enterprise Resource Planning and Management System, Information Technologies in Education, etc.
We sincerely hope that the 2013 International Forum on Computer and Information Technology is a significant step forward.
(ID: 212.3.110.94-03/03/14,10:09:30)2013 International Forum on Computer and Information Technology (IFCIT 2013) Conference Organization Co-Chairmen Prof.
Online since: January 2022
Authors: Xiong Zhang, Zi Li Wu, Xiang Hua Zeng, Qian Dai
Enhanced Performance of the Non-Polar Ultraviolet Light-Emitting Diodes with Lattice-Matched Quaternary Quantum Barriers
Qian Dai1,a,*, Xiong Zhang2,b, Zili Wu2,c and Xianghua Zeng3,d
1School of Network and Communication Engineering, Jinling Institute of Technology, Nanjing, Jiangsu, China
2Advanced Photonics Center, School of Electronic Science and Engineering, Southeast University, Nanjing, Jiangsu, China
3College of Physics Science and Technology, Yangzhou University, Yangzhou, Jiangsu, China
adaiqian@jit.edu.cn, bxzhang62@aliyun.com, c230189117@seu.edu.cn, dxhzeng@yzu.edu.cn
Keywords: non-polar AlGaN-based UV-LED, AlInGaN quaternary barriers, lattice match, internal quantum efficiency
Abstract.
In this paper, the electrical and optical characteristics of a non-polar a-plane AlGaN-based UV-LED with lattice matched quantum barriers along the [1-100] direction were intensively analyzed with the advanced physical model of semiconductor devices (APSYS) simulation program.
Forum Vol. 68 (1996) p. 40 [20] Y.
Forum Vol. 158 (2011) p.
Forum Vol. 117 (2020) p. 012105.
In this paper, the electrical and optical characteristics of a non-polar a-plane AlGaN-based UV-LED with lattice matched quantum barriers along the [1-100] direction were intensively analyzed with the advanced physical model of semiconductor devices (APSYS) simulation program.
Forum Vol. 68 (1996) p. 40 [20] Y.
Forum Vol. 158 (2011) p.
Forum Vol. 117 (2020) p. 012105.
Online since: August 2009
Authors: Xing Ma, Y.Y. Hu, Xiao Ming Wu, J. Liu, Zhuo Xiong, Y.N. Yan, R. Lv, J. Wang
China
3
Department of Biomedical Engineering, Fourth Military Medical University, Xi'an, 710032, P.
China 4 Key Laboratory for Advanced Materials Processing Technology, Ministry of Education & Center of Organ Manufacturing, Department of Mechanical Engineering, Tsinghua University, Beijing, 100084, P.
Forum Vol. 250 (1997), p.151 [2] M.E.
Forum Vol. 514-516 (2006), p.980 [3] Z.
Forum Vol. 532-533 (2006), p.745 [16] T.
China 4 Key Laboratory for Advanced Materials Processing Technology, Ministry of Education & Center of Organ Manufacturing, Department of Mechanical Engineering, Tsinghua University, Beijing, 100084, P.
Forum Vol. 250 (1997), p.151 [2] M.E.
Forum Vol. 514-516 (2006), p.980 [3] Z.
Forum Vol. 532-533 (2006), p.745 [16] T.
Online since: January 2013
Authors: Sergey P. Lebedev, Alla A. Sitnikova, Marina G. Mynbaeva, Vassili N. Petrov, Demid A. Kirilenko, Irina S. Kotousova, Alexander Smirnov, Alexander A. Lavrent'ev
The feasibility of porous SiC for bio–engineering has been shown in pioneering works by A.J.
Saddow, Silicon carbide biotechnology: biocompatible semiconductor for advanced biomedical devices and applications, Elsevier, Amsterdam, 2012
Gorga, Nanofibrous composites for tissue engineering applications, WIREs Nanomed.
Forum 527–529 (2006) 751–754
Forum 483–485 (2004) 269–272
Saddow, Silicon carbide biotechnology: biocompatible semiconductor for advanced biomedical devices and applications, Elsevier, Amsterdam, 2012
Gorga, Nanofibrous composites for tissue engineering applications, WIREs Nanomed.
Forum 527–529 (2006) 751–754
Forum 483–485 (2004) 269–272
Online since: October 2006
Authors: Shin Ichi Nishizawa, Michel Pons
From the engineering point of view, SiC hot-wall epitaxy is a very important process in
SiC semiconductor processes.
The requirements for the epitaxial process strongly depend on the devices, so there are many investigations from fundamental to engineering levels.
Design of Engineering Epitaxial Reactor.
From the engineering points of view, it is necessary to keep good uniformity of both epitaxial layer thickness and doping concentration, inside a wafer and between wafers.
In the experiment, there are lots of investigations that try to understand the fundamental processes and also try to develop engineering reactors.
The requirements for the epitaxial process strongly depend on the devices, so there are many investigations from fundamental to engineering levels.
Design of Engineering Epitaxial Reactor.
From the engineering points of view, it is necessary to keep good uniformity of both epitaxial layer thickness and doping concentration, inside a wafer and between wafers.
In the experiment, there are lots of investigations that try to understand the fundamental processes and also try to develop engineering reactors.
Online since: October 2010
Authors: Si Si Zeng, Peng Sun, Hong Quan Yu, Yan Bo Wu
Template assisted ultrasonic process synthesis and luminescent properties of Eu3+ doped LaPO4 nanocrystals
Yanbo Wu1,a, Peng Sun1,b, Hongquan Yu1,c, Sisi Zeng1,d
1College of Environmental Science and Engineering, Dalian Jiaotong University, Dalian, Liaoning 116028, PR China
awuyanbo_djd@126.com, bsunpeng417@163.com, c yuhq7808@yahoo.com.cn, das_zeng@126.com
Keywords: ultrasonic method, LaPO4:Eu3+, PVP, CTAB, P123, luminescent properties
Abstract.
Since this report, optical properties of nanosized luminescence materials have been investigated extensively due to the possibilities for advanced applications, especially for improving the spatial resolution of display units such as high-resolution cathode-ray tubes (CRTs)[2] and plasma display panels (PDPs)[3].
Forum Vol 840 (1999), p.11
Forum Vol 27(2009), p 182
Forum Vol 8 (1974), p 331
Since this report, optical properties of nanosized luminescence materials have been investigated extensively due to the possibilities for advanced applications, especially for improving the spatial resolution of display units such as high-resolution cathode-ray tubes (CRTs)[2] and plasma display panels (PDPs)[3].
Forum Vol 840 (1999), p.11
Forum Vol 27(2009), p 182
Forum Vol 8 (1974), p 331