Electrophoretic Deposition: Fundamentals and Applications IV

Electrophoretic Deposition: Fundamentals and Applications IV

Description:

Volume is indexed by Thomson Reuters CPCI-S (WoS).
The contributions to this special collection cover a wide range of subject areas related to EPD and reflect the impressive versatility of that technique for materials processing. The topics discussed range from theoretical studies of the fundamental mechanisms of EPD, to novel techniques which exploit EPD for the efficient and cost-effective fabrication of a variety of advanced materials.

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Info:

Editors:
A. R. Boccaccini, O. Van der Biest, R. Clasen and J.H. Dickerson
THEMA:
MB, PDT, TGM
BISAC:
TEC021000
Details:
Selected, peer reviewed papers from the 4th International Conference on Electrophoretic Deposition: Fundamentals and Applications, October 2-7, 2011, Puerto Vallarta, Mexico
Pages:
260
Year:
2012
ISBN-13 (softcover):
9783037853795
ISBN-13 (CD):
9783037952023
ISBN-13 (eBook):
9783038136927
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Review from Ringgold Inc., ProtoView: The 37 papers cover advanced experimental techniques and theoretical approaches to electrophoretic deposition; nanostructured materials, carbon nanotubes, and thin films; biomaterials and biological entities; electrophoretic deposition integrated manufacturing technologies, and electrophoretic deposition in ceramic processing. Among the specific topics are pulse electric fields for electrophoretic deposition of thermal barrier coatings, electrophoretic deposition onto ionic liquid layers, cadmium sulfide and zinc sulfide nanostructures formed by electrophoretic deposition, electrophoretic deposition of phosphors for display and solid state lighting technologies, and characterizing ceramic powder surface by contact angle measurements and infrared spectroscopy.