Silicon Carbide and Related Materials 2007

Silicon Carbide and Related Materials 2007

Description:

Wide-bandgap semiconductors, such as silicon carbide and group-III nitrides have attracted increasing attention as promising target materials for high-power, high-frequency and high-temperature electronics use, as well as exploitation as short-wavelength light-emitters.
Volume is indexed by Thomson Reuters CPCI-S (WoS).

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Info:

Editors:
Akira Suzuki, Hajime Okumura, Prof. Tsunenobu Kimoto, Takashi Fuyuki, Kenji Fukuda and Dr. Shin-ichi Nishizawa
THEMA:
TGM
BISAC:
SCI077000
Details:
Selected, peer reviewed papers from the International Conference on Silicon Carbide and Related Materials 2007, Otsu Prince Hotel Convention Hall, Lake Biwa Resort, Otsu, Japan, October 14 – 19, 2007
Pages:
1434
Year:
2009
ISBN-13 (softcover):
9780878493579
ISBN-13 (CD):
9783908453116
ISBN-13 (eBook):
9783038132622
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Review from Ringgold Inc., ProtoView: Selected and peer reviewed, over 350 papers offer scientific treatments of materials used for wide bandgap semiconductors, emphasizing recent developments in the basic science of the materials themselves and the maturing device and processing technologies. They cover silicon carbide (SiC) growth and epitaxial growth, physical properties and characteristics, nanostructures and graphene, processing, devices, and III-nitrides and other related materials. Among specific topics are growing bulk crystal at a constant rate using a new design of resistive furnace, the solution growth of 3C-SiC single crystals by the cold crucible technique, Raman scattering studies of stress distribution around dislocation, the electronic band structure of cubic silicon nanowires, the anisotropic etching of SiC in the mixed gas of chlorine and oxygen, the temperature dependence of plasma chemical vaporization machining of silicon and silicon carbide, the influence of passivation oxide properties on SiC field-plated buried gate MESFETs, a high power-density converter, surface morphology in an AIN epitaxial layer grown on various SiC substrates by the sublimation closed space technique, and diamond doped by hot iron implantation. The two volumes are paged together, and both contain the author index; there is no subject index.