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Articles by author: Alessio Beverina

• Advanced Surface Cleaning Strategy for 65nm CMOS Device Performance Enhancement
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p37)
• Barrier and Copper Seedlayer Wet Etching
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p361)
• Fracture Behaviour of Pressureless Sintered Nickel-Reinforced Alumina Composites
  Published in: Fractography of Advanced Ceramics II (p324)
• High-k Gate Dielectrics on Silicon and Germanium: Impact of Surface Preparation
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p3)
• Low Consumption Front End of the Line Cleaning: LC-FEOL
  Published in: Ultra Clean Processing of Silicon Surfaces V (p199)
• Post Copper CMP: a Two Steps Cleaning Recipe
  Published in: Ultra Clean Processing of Silicon Surfaces V (p299)
• Post SiN Etching Cleaning During Copper and Low K Integration
  Published in: Ultra Clean Processing of Silicon Surfaces V (p101)
• 'Resist / Wet Etch' Couple for Dual Gate Oxide
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p235)
• Si-Purifier: A Point of Use Purifier for Noble Metals in HF Baths
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p63)