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Articles by author: D. Krüger

• Application of Small Pulsed Ion Beams for Depth Profiling on Beveled Semiconductor Structures
  Published in: Beam Injection Assessment of Defects in Semiconductors (p465)
• Failure Mode Analysis of a 0.25 μm CMOS Technology by Scanning Electron and Ion Beams
  Published in: Beam Injection Assessment of Defects in Semiconductors (p433)
• Gettering of Au in Heat Treated Si/SiGe/Si Structures
  Published in: Gettering and Defect Engineering in Semiconductor Technology VI (p171)
• Oxygen Ion Bombardment for Local Oxide Formation in Si
  Published in: Gettering and Defect Engineering in Semiconductor Technology X (p77)
• Point Defect Concentrations, Distributions and Diffusivity in Thin Si MBE-Films: Experiments and Simulations Based on Profiling of Implanted Multiple Delta Doping Structures
  Published in: Gettering and Defect Engineering in Semiconductor Technology VI (p313)
• Precise Measurement of Ge Depth Profiles in SiGe HBT's - a Comparison of Different Methods
  Published in: Gettering and Defect Engineering in Semiconductor Technology X (p473)
• SiC Buried Layer Formation Induced by Ion Implantation
  Published in: Gettering and Defect Engineering in Semiconductor Technology VI (p211)