HOME CONTACT My eBook

Username: Password:

> @scientific.net

Articles by author: Geun Min Choi

• A Hydrogenated Water Application to Semiconductor Manufacturing
  Published in: Ultra Clean Processing of Silicon Surfaces V (p71)
• Elimination of Watermark on Extremely High-Doped Poly-Silicon Surfaces Using HF-Vapor Cleaning
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p27)
• Evaluation of Wafer Drying Methods for GIGA-LEVEL Device Fabrication
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p67)
• Metal Wet Cleaning with No Corrosion: A Novel Approach
  Published in: Ultra Clean Processing of Silicon Surfaces V (p35)
• Metallic Impurity Contamination from Tungsten Gate Cleaning
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p23)
• The Dependence of Chemical Mechanical Polishing Residue Removal on Post-Cleaning Treatments
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p303)
• The Effect of Various Process Induced Damages on Wet Etching Rate Difference
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p143)
• The Role of Oxidant in HF-Based Solution for Noble Metal Removal from Substrate
  Published in: Ultra Clean Processing of Silicon Surfaces V (p267)