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Articles by author: Isabel Ferreira

• Batch Processing Method to Deposit a-Si:H Films by PECVD
  Published in: Advanced Materials Forum II (p104)
• Composition, Structure and Optical Characteristics of Polymorphous Silicon Films Deposited by PECVD at 27.12 MHz
  Published in: Advanced Materials Forum II (p100)
• Effect of Annealing on Gold Rectifying Contacts in Amorphous Silicon
  Published in: Advanced Materials Forum II (p96)
• Growth Model of Gas Species Produced by the Hot-Wire and Hot-Wire Plasma-Assisted Techniques
  Published in: Advanced Materials Forum I (p603)
• Growth of Polymorphous/Nanocrystalline Silicon Films Deposited by PECVD at 13.56 MHz
  Published in: Advanced Materials Forum II (p532)
• Highly Conductive/Transparent ZnO:Al Thin Films Deposited at Room Temperature by rf Magnetron Sputtering
  Published in: Advanced Materials Forum I (p571)
• Influence of Hydrogen Gas Dilution on the Properties of Silicon-Doped Thin Films Prepared by the Hot-Wire Plasma-Assisted Technique
  Published in: Advanced Materials Forum I (p591)
• Insights on Amorphous Silicon Nip and MIS 3D Position Sensitive Detectors
  Published in: Advanced Materials Forum III (p13)
• Large-Area Polycrystalline p-Type Silicon Films Produced by the Hot Wire Technique
  Published in: Polycrystalline Semiconductors VI (p47)
• Multifunctional Thin Film Zinc Oxide Semiconductors: Application to Electronic Devices
  Published in: Advanced Materials Forum III (p3)
• Optical and Microstructural Investigations of Porous Silicon Coated with a-Si:H Using PECVD Technique
  Published in: Advanced Materials Forum IV (p308)
• Optical and Photoelectric Properties of PZT Films for Microelectronic Applications
  Published in: Advanced Materials Forum I (p563)
• Role of Hydrogen Plasma on the Electrical and Optical Properties of Indium Zinc Transparent Conductive Oxide
  Published in: Advanced Materials Forum III (p63)
• Role of the Density of States in the Colour Selection of the Collection Spectrum of Amorphous Silicon-Based Schottky Photodiodes
  Published in: Advanced Materials Forum I (p559)
• Silicon Films Produced by PECVD under Powder Formation Conditions
  Published in: Plasma Processing and Dusty Particles (p21)