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Articles by author: Luís Pereira

• A Study on the Electrical Properties of ZnO Based Transparent TFTs
  Published in: Advanced Materials Forum III (p68)
• Batch Processing Method to Deposit a-Si:H Films by PECVD
  Published in: Advanced Materials Forum II (p104)
• Effect of Annealing on Gold Rectifying Contacts in Amorphous Silicon
  Published in: Advanced Materials Forum II (p96)
• Electrical Performances of Low Temperature Annealed Hafnium Oxide Deposited at Room Temperature
  Published in: Advanced Materials Forum III (p58)
• Growth of Polymorphous/Nanocrystalline Silicon Films Deposited by PECVD at 13.56 MHz
  Published in: Advanced Materials Forum II (p532)
• In-Situ GIXRD Characterization of the Crystallization of Ni-Ti Sputtered Thin Films
  Published in: Advanced Materials Forum II (p342)
• MIS Photodiodes of Polymorphous Silicon Deposited at Higher Growth Rates by 27.12 MHz PECVD Discharge
  Published in: Advanced Materials Forum II (p73)
• Multifunctional Thin Film Zinc Oxide Semiconductors: Application to Electronic Devices
  Published in: Advanced Materials Forum III (p3)
• Ni Related Centers in Synthetic Diamond
  Published in: Defects in Semiconductors 18 (p79)
• Poly-Si Thin Film Transistors: Effect of Metal Thickness on Silicon Crystallization
  Published in: Advanced Materials Forum III (p28)
• Role of Substrate on the Growth Process of Polycrystalline Silicon Thin Films by Low-Pressure Chemical Vapour Deposition
  Published in: Advanced Materials Forum II (p112)
• Role of the Density of States in the Colour Selection of the Collection Spectrum of Amorphous Silicon-Based Schottky Photodiodes
  Published in: Advanced Materials Forum I (p559)
• Role of the i-Layer Thickness in the Performance of a-Si:H Schottky Barrier Photodiodes
  Published in: Advanced Materials Forum I (p587)
• Silicon Etching in CF₄/O₂ and SF₆ Atmospheres
  Published in: Advanced Materials Forum II (p120)
• Sputtering Preparation of Silicon Nitride Thin Films for Gate Dielectric Applications
  Published in: Advanced Materials Forum II (p69)