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Articles by author: Martine Claes

• A Controlled Deposition of Organic Contamination and the Removal with Ozone Based Cleanings
  Published in: Ultra Clean Processing of Silicon Surfaces V (p223)
• Advanced Metrologies for Cleans Characterization: ARXPS, GIXF and NEXAFS
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p281)
• Determination of Photoresist Degradation Products in O₃/DI Processing
  Published in: Ultra Clean Processing of Silicon Surfaces V (p207)
• Modification of Photoresist by UV for Post-Etch Wet Strip Applications
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p323)
• Open Circuit Potential Analysis as a Fast Screening Method for the Quality of High-k Dielectric Layers
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p7)
• Photoresist Characterization and Wet Strip after Low-k Dry Etch
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p325)
• Pre-Diffusion Cleaning Using Ozone and HF
  Published in: Ultra Clean Processing of Silicon Surfaces V (p85)
• Surface Characterization after Different Wet Chemical Cleans
  Published in: Ultra Clean Processing of Silicon Surfaces V (p67)