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Articles by author: Takeshi Hattori

• Challenges of Finer Particle Detection on Bulk-Silicon and SOI Wafers
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p121)
• Characterization of Oxide Films on SiC Epitaxial (000-1) Faces by Angle-Resolved Photoemission Spectroscopy Measurements Using Synchrotron Radiation
  Published in: Silicon Carbide and Related Materials 2004 (p585)
• Chemical Additive Formulations for Particle Removal in SCCO₂-Based Cleaning
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p193)
• Effect of Pressure Pulsation on Post-Etch Photoresist Stripping on Low-k Films in Supercritical CO₂
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p341)
• Effect of Wafer Rotation on Photoresist Stripping in Supercritical CO₂
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p355)
• Energy Loss of O1s Photoelectrons in Compositional and Structural Transition Layer at and near the SiO₂/Si Interface
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p241)
• Etching of Silicon Oxide Films in Supercritical Carbon Dioxide
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p115)
• Layer-By-Layer Oxidation of Silicon
  Published in: Ultra Clean Processing of Silicon Surfaces V (p139)
• Organic Contamination Control in Silicon Surface Processing
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p49)
• P-Type Electrical Conduction of LaInO₃ Based Ceramics and Calculation of its Density of States
  Published in: Electroceramics in Japan IV (p65)
• Tendencies of p-Type Thermoelectric Oxide Semiconductor
  Published in: Electroceramics in Japan II (p67)
• Wafer Cleaning Using Supercritical CO₂ in Semiconductor and Nanoelectronic Device Fabrication
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p97)