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CONFERENCE
6/16/2013 - 6/19/2013
The 7th International conference on Physical and Numerical Simulation of Materials Processing
5/16/2013 - 5/19/2013
2nd International Congress on Advanced Materials
4/13/2013 - 4/14/2013
2013 2nd lnternational Conference on lntclligent Materials, Applied Mechanics and Design Science (IMAMD 2013)
more...
Articles by keyword: «
Interface States (or Traps)
»
143 papers on 10 pages:
1
[2]
[3]
...
[10]
[next]
SiC/SiO
2
Interface States: Properties and Models
Published in:
Silicon Carbide and Related Materials 2004
(p563)
4H-SiC ACCUFET with a Two-Layer Stacked Gate Oxide
Published in:
Silicon Carbide and Related Materials 2001
(p1073)
4H-SiC Metal-Oxide-Semiconductor (MOS) Capacitors Fabricated by Oxidation in a Tungsten Lamp Furnace in Combination with a Microwave Plasma and Subsequent Deposition of Al
2
O
3
Published in:
Silicon Carbide and Related Materials 2006
(p627)
4H-SiC MOSFETs on (03-38) Face
Published in:
Silicon Carbide and Related Materials 2001
(p1065)
4H-SiC MOSFETs on C(000-,1) Face with Inversion Channel Mobility of 127cm
2
/Vs
Published in:
Silicon Carbide and Related Materials 2003
(p1417)
A Cause for SiC/SiO
2
Interface States: the Site Selection of Oxygen in SiC
Published in:
Silicon Carbide and Related Materials - 2002
(p535)
A Comparison between SiO
2
/4H-SiC Interface Traps on (0001) and (11-20) Faces
Published in:
Silicon Carbide and Related Materials 2003
(p1305)
A Study of Deep Energy-Level Traps at the 4H-SiC/SiO
2
Interface and Their Passivation by Hydrogen
Published in:
Silicon Carbide and Related Materials 2007
(p755)
A Study of Organo-Metallic Interfaces Using DBAR
Published in:
Positron Annihilation - ICPA-12
(p457)
A Study of the Shallow Electron Traps at the 4H-SiC/SiO
2
Interface
Published in:
Silicon Carbide and Related Materials - 2002
(p547)
Analysis of Forward Current-Voltage Characteristics of Non-Ideal Ti/4H-SiC Schottky Barriers
Published in:
Silicon Carbide and Related Materials 2008
(p431)
Analysis of the Electron Traps at the 4H-SiC/SiO
2
Interface of a Gate Oxide Obtained by Wet Oxidation of a Nitrogen Pre-Implanted Layer
Published in:
Silicon Carbide and Related Materials 2008
(p533)
Anomalously High Density of Interface States Near the Conduction Band in SiO
2
/4H-SiC MOS Devices
Published in:
Silicon Carbide and Related Materials - 1999
(p1069)
As-Grown and Process-Related Defects in Schottky Barrier Diodes Fabricated on Bulk Off-Axis n-Type 6H-SiC
Published in:
Silicon Carbide and Related Materials 2003
(p697)
Asymmetric Interface Densities on n and p Type GaN MOS Capacitors
Published in:
Silicon Carbide and Related Materials 2005
(p1525)
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