| Paper Title | Page |
|---|---|
|
SiC/SiO2 Interface States: Properties and Models Authors: Valeri V. Afanas'ev, Florin Ciobanu, Sima Dimitrijev, Gerhard Pensl, Andre Stesmans |
563 |
|
4H-SiC ACCUFET with a Two-Layer Stacked Gate Oxide Authors: Saichirou Kaneko, Hideaki Tanaka, Yoshio Shimoida, Norihiko Kiritani, Satoshi Tanimoto, Mitsugu Yamanaka, Masakatsu Hoshi |
1073 |
|
Authors: Svetlana Beljakowa, Thomas Frank, Gerhard Pensl, Kun Yuan Gao, Florian Speck, Thomas Seyller |
627 |
|
4H-SiC MOSFETs on (03-38) Face Authors: T. Hirao, Hiroshi Yano, Tsunenobu Kimoto, Hiroyuki Matsunami, Hiromu Shiomi |
1065 |
|
4H-SiC MOSFETs on C(000-,1) Face with Inversion Channel Mobility of 127cm2/Vs Authors: Kenji Fukuda, Makoto Kato, Junji Senzaki, Kazutoshi Kojima, Takaya Suzuki |
1417 |
|
A Cause for SiC/SiO2 Interface States: the Site Selection of Oxygen in SiC Authors: Peter Deák, Adam Gali, Z. Hajnal, Thomas Frauenheim, Nguyen Tien Son, Erik Janzén, Wolfgang J. Choyke, P. Ordejón |
535 |
|
A Comparison between SiO2/4H-SiC Interface Traps on (0001) and (11-20) Faces Authors: H.Ö. Ólafsson, Christer Hallin, Einar Ö. Sveinbjörnsson |
1305 |
|
A Study of Deep Energy-Level Traps at the 4H-SiC/SiO2 Interface and Their Passivation by Hydrogen Authors: Fredrik Allerstam, Einar Ö. Sveinbjörnsson |
755 |
|
A Study of Organo-Metallic Interfaces Using DBAR Authors: C.E. Tucker, F.A. Smith, Paul G. Coleman |
457 |
|
A Study of the Shallow Electron Traps at the 4H-SiC/SiO2 Interface Authors: H.Ö. Ólafsson, Einar Ö. Sveinbjörnsson, T.E. Rudenko, V.I. Kilchytska, I.P. Tyagulski, I.N. Osiyuk |
547 |