Papers by Keyword: Lateral Epitaxial Overgrowth

Abstract: Planar m-plane GaN was grown on (1100) m-plane 6H-SiC substrates using high-temperature AlN nucleation layers by metalorganic chemical vapor deposition. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) images showed striated features on the sample surface aligned along the GaN [1120] direction, which are perpendicular to those associated with (1120) a-plane GaN. The epitaxial relationship between the m-GaN and 6H-SiC was analyzed using high-resolution x-ray diffraction (XRD). In order to reduce the defect density, epitaxial lateral overgrowth (ELO) was carried out on an m-GaN template with mask stripes along the GaN [1120] direction, which makes the lateral growth fronts advance along the GaN c-axis. On-axis XRD rocking curves show that the full width at half maximum (FWHM) values for the ELO samples were reduced by nearly half when compared to those of the m-plane template without ELO. Clear atomic steps were observed in the wing regions by AFM. The absence of the striated features that are associated with the template could be indicative of the reduction of basal stacking faults in the ELO wings. Low-temperature photoluminescence (PL) spectra showed an excitonic emission at 3.47eV, a basal stacking fault (BSF)-related emission at 3.41 eV, and other defect-related emissions at 3.29 eV and 3.34 eV.

Abstract: Nitride-based optoelectronic devices prepared in the c orientation have been successfully introduced to the global marketplace and are changing the way we think about lighting. A part of the research interest has shifted toward nonpolar and semipolar orientations, which has the potential to broaden the scope and impact of this technology. This is because quantum-well structures prepared in nonpolar and semipolar orientations are able to suppress the quantum-confinement Stark effect, which has a negative impact on optoelectronic device performance. The lower crystal symmetry of such orientations provides spontaneously polarized light emission. Despite these attractive properties of nonpolar and semipolar orientations, the corresponding materials growth is not trivial. The present chapter discusses our efforts on growth of III-nitride materials in nonpolar and semipolar orientations and the related material properties.

Abstract: Lateral epitaxial overgrowth (LEO) is known as method of defects reduction for GaN. LEO is expected to reduce crystal defects on hetero-epitaxial growth of 3C-SiC. (100) Si substrate patterned with SiO2 mask was used as the substrate. Before CVD process, V shape crater was made on Si surface by HCl etching. And growth condition of CVD was optimized. Single crystal of 3C-SiC was grown laterally on SiO2 layer. Cross-sectional transmission electron microscopic observation indicated that crystal quality of LEO region was single and no defect crystal.