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Articles by keyword: «Metal Gate»

• All-Wet, Metal-Compatible High-Dose-Implanted Photoresist Strip
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p101)
• Development of a New TaN Etchant for Metal Gate
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p75)
• Galvanic Corrosion of Stacked Metal Gate Electrodes during Cleaning in HF Solutions
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p87)
• Impact of Galvanic Corrosion on Metal Gate Stacks
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p215)
• Influence of Dry Ashing and Wet Treatments on NVM Metal Gate Structures
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p257)
• Influence of Metal Electrode(Ag,Au,Pt) on the Dielectric and Electrical Properties of HfTaO Capacitors
  Published in: New and Advanced Materials (p1757)
• Material Loss Impact on Device Performance for 32nm CMOS and Beyond
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p245)
• Selective Wet Removal of Hf-Based Layers and Post-Dry Etch Residues in High-k and Metal Gate Stacks
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p93)
• Study of a Metal Gate and Silicon Selective “Dry Ash Only” Process for Combined Extension and Halo Implanted Photo Resist
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p113)
• Tungsten Oxidation Kinetic after Wet Cleaning: XPS and ToF-SIMS Characterization
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p227)
• Wafer Backside Cleaning Strategies for High-k/Metal Gate Processing
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p241)